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Control of Metal Film Properties by Ion Assisted Deposition

Published online by Cambridge University Press:  25 February 2011

Ronnen A. Roy ,
Dennis S. Yee  and
Jerome J. Cuomo
Ronnen A. Roy
Affiliation:
IBM Research Division, Watson Research Center, P.O. Box 218, Yorktown Heights, N.Y., 10598
Dennis S. Yee
Affiliation:
IBM Research Division, Watson Research Center, P.O. Box 218, Yorktown Heights, N.Y., 10598
Jerome J. Cuomo
Affiliation:
IBM Research Division, Watson Research Center, P.O. Box 218, Yorktown Heights, N.Y., 10598
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Abstract

Ion-assisted deposition allows for independent control of ion energy, ion flux, and adatom flux incident on the growing film. We describe herein general trends in property and structure modification of thin film metals using this technique.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 128: Symposium A – Processing and Characterization of Materials Using Ion Beams , 1988 , 23
Copyright
Copyright © Materials Research Society 1989

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References

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