Although dielectric polishing is primarily mechanical in nature, surface chemical effects can be tailored to enhance material removal, selectivity and planarity. The use of ceria abrasives in oxide polishing is particularly attractive because of favorable polishing characteristics that are generally not obtainable using conventional fumed or colloidal silica abrasives. Unfortunately, a characteristic of ceria abrasive is an enhanced tendency toward defectivity in comparison with conventional silica. Entirely novel composite structures comprising 300 nm polymer particles coated by ceria (specific surface area of the powder 61 m2/g), are achieved by either adding silane coupling agents (Composite A) or tuning the pH in order to form electrostatic attractive interactions between the core and the shell (Composite B). The polymer core shows mechanical properties that are highly tunable by variation of its synthesis parameters, while the major advantage of the ceria coating is an enhanced chemical action of the abrasive particles, commonly referred to as the chemical tooth model. In this study we report the evolution of RR, haze, and defects such as particles and scratches in CMP experiments on high-density plasma (HDP) silicon oxide using four abrasive types (14 nm primary size ceria particles, 300 nm polymer particles, composites A and B) at pH 3 and 10. Interestingly, the two types of composite exhibit different RR. This is attributed to differences in morphology and surface composition. Composite B presents more similarities with the ceria, as confirmed by particle / silica surface adhesion forces in different pH solutions, measured by a colloidal AFM technique.