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A Comparison of the Physical Properties of Cluster-Based and Vacuum-Evaporated Thin Metal Films

Published online by Cambridge University Press:  21 February 2011

J. D. Bielefeld
Affiliation:
School of Chemical Engineering, Purdue University, West Lafayette, IN 47907
R. G. Osifchin
Affiliation:
School of Chemical Engineering, Purdue University, West Lafayette, IN 47907
R. P. Andres
Affiliation:
School of Chemical Engineering, Purdue University, West Lafayette, IN 47907
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Abstract

The physical properties of a thin metal film are highly dependent on the process by which the film is formed. Using the Multiple Expansion Cluster Source (MECS), it is possible to form an inert gas aerosol containing neutral metal clusters with uniform diameters in the nanometer size range. Cluster-based (CBD) films can be deposited directly from this aerosol or can be formed from colloidal clusters captured from the aerosol. We present TEM data comparing the initial microstructure of gold films formed by these two CBD processes and also by vacuum-evaporation (PVD). Electrical resistivity versus nominal thickness are also presented for the aerosol deposited CBD and the PVD cases.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

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References

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