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Comparison of the Hafnium Diboride(0001) and Hafnium(0001) Surfaces

Published online by Cambridge University Press:  10 February 2011

M. Belyansky ,
M. Trenary ,
S. Otani  and
T. Tanaka
M. Belyansky
Affiliation:
Department of Chemistry, University of Illinois at Chicago, 845 W. Taylor St., Room 4500, Chicago, IL 60607
M. Trenary
Affiliation:
Department of Chemistry, University of Illinois at Chicago, 845 W. Taylor St., Room 4500, Chicago, IL 60607
S. Otani
Affiliation:
National Institute for Research in Inorganic Materials, Tsukuba, Ibaraki, Japan
T. Tanaka
Affiliation:
National Institute for Research in Inorganic Materials, Tsukuba, Ibaraki, Japan
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Abstract

The surface properties of the (0001) surfaces of single crystals of hafnium and hafnium diboride are compared with a boride film deposited on the Hf(0001) surface. The surfaces were characterized with X-ray photoelectron spectroscopy (XPS) and low energy electron diffraction (LEED). Boron deposition was achieved through the thermal decomposition of diborane. The deposited boron reacts with the hafnium substrate to form HfB2 as determined by XPS and the HfB2 films were found to be epitaxial as determined by LEED. The epitaxial nature of the thin films was confirmed with X-ray diffraction. The epitaxial thin films of HfB2 on Hf(0001) display properties identical to those of the HfB2(0001) single crystal surface.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 441: Thin Films – Structure and Morphology , 1996 , 463
Copyright
Copyright © Materials Research Society 1997

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