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A Comparative Study of the Reflectance Difference Spectrum from Si(001) Using Reflectance Difference Spectroscopy /Low-Energy Electron Diffraction/Scanning Tunneling Microscopy

Published online by Cambridge University Press:  15 February 2011

Jia-Ling Lin
Affiliation:
University of Wisconsin-Madison, Madison, WI 53706
S. G. Jaloviar
Affiliation:
University of Wisconsin-Madison, Madison, WI 53706
L. Mantese
Affiliation:
North Carolina State University, Raleigh, NC 27695
D. E. Aspnes
Affiliation:
North Carolina State University, Raleigh, NC 27695
L. McCaughan
Affiliation:
University of Wisconsin-Madison, Madison, WI 53706
M. G. Lagally
Affiliation:
University of Wisconsin-Madison, Madison, WI 53706
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Abstract

From a comparative study using scanning tunneling microscopy, high-resolution lowenergy electron diffraction, and reflectance difference spectroscopy, we investigate the optical anisotropy on clean and H-covered Si(001) surfaces. We demonstrate a high sensitivity of reflectance difference spectroscopy to the surface tructural anisotropy and surface chemistry.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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References

[1] Yasuda, T., Mantese, L., Rossow, U. and Aspnes, D.E., Phys. Rev. Lett. 74, 3431 (1995); A.R. Turner, M.E. Pemble, J.M. Fernandez, B.A. Joyce, J. Zhang and A.G. Taylor, Phys. Rev. Lett. 74, 3213 (1995).Google Scholar
[2] For a review of early RDS studies, see Aspnes, D.E., IEEE J. Quant. Electronis 25, 1056 (1989); see also W. Richter, Phil. Trans. R. Soc. Lond. A 344, 453 (1993).Google Scholar
[3] Shkrebtii, A.I. and Sole, R. Del, Phys. Rev. Lett. 70, 2645 (1993).Google Scholar
[4] Swartzentruber, B.S., Mo, Y.-W., Kariotis, R., Lagally, M. G. and Webb, M.B., Phys. Rev. Lett. 65, 1913 (1990); R. Kaplan, Surface Sci. 93, 145 (1980); B.S. Swartzentruber, N. Kitamura, M. G. Lagally and M.B. Webb, Phys. Rev. B 47, 13432 (1993).Google Scholar
[5] Alerhand, O.L., Berker, A. N., Joannopoulos, J.D., Vanderbilt, D., Hamers, R.J. and Demuth, J.E., Phys. Rev. Lett. 64, 2406 (1990); E. Pehlke and J. Tersoff, Phys. Rev. Lett. 67, 465 (1991).Google Scholar
[6] Kelly, M.K., Zollner, S. and Cardona, M., Surf. Sci. 285, 282 (1993).Google Scholar
[7] Aspnes, D.E., J. Vac. Sci. tech B 3, 1498 (1985); D.E. Aspnes and A.A. Studna, Phys. Rev. Lett. 54, 1956 (1985); C. Wijers, G. Poppe, P. de Boeji, H. Bekker and D. Wentink, Thin Solid Films 233, 28 (1993).Google Scholar
[8] Aumann, C.E., Miguel, J.J. de, Kariotis, R. and Lagally, M.G., Surf. Sci. 275, 1 (1992).Google Scholar
[9] Varshni, Y.P., Physica 34, 149 (1967).Google Scholar
[10] Vuye, G., Fisson, S., Nguyen Van, V., Wang, Y., Rivory, J. and Abelés, F., Thin Solid Films 233, 166170 (1993).Google Scholar
[11] Mantese, L., Rossow, U. and Aspnes, D.E., 42nd National AVS Symposium, Oct. 16–20, 145 (1995).Google Scholar
[12] Sakurai, T. and Hagstrum, H.D., Phys. Rev. B 14, 1593 (1976); Y.J. Chabal and Krishnan Raghavachari, Phys. Rev. Lett. 54, 1055 (1985).Google Scholar