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Chemical Vapor Deposition of Chromium Carbide from Organometallic Precursors

  • N. M. Rutherford (a1), C. E. Larson (a1) and R. L. Jackson (a1)

Abstract

Chemical vapor deposition from CpCr(CO)3H, Cr(CH2CMe3)4, and Cr(NPri 2)3 at low pressures yields chromium carbide films at temperatures as low as 330 °C. The films are mirror-bright and extremely smooth with no significant features observable by SEM. In general, films prepared at higher temperatures had lower resistivities, and were more likely to be crystalline than those prepared at lower temperatures. However, amorphous films deposited at 330 °C were much harder than the crystalline films. Chemical vapor deposition from Cr(NPri 2)3 resulted in carbide films with the most desirable properties.

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1. Williams, J.O., Spec. Publ. R. Soc. Chem. 60 1 (1986).
2. Manasevit, H.M., J. Cryst. Growth 13–14, 306 (1972).
3. Hintermann, H.E., Perry, A.J., Horvath, E., Wear 47, 407 (1978).
4. Dupis, R.D., Science 226, 623 (1984).
5. Uwaik, K., Nakagome, H., Takahei, K., Appl. Phys. Lett. 50, 977 (1987).
6. Fujita, S., Sakamoto, T., Isemura, M., Fujita, S., J. Cryst. Growth 87, 581 (1988).
7. Green, M.L., Levy, R.A., Nuzzo, R.G., Coleman, E., Thin Solid Films 114, 367 (1984).
8. Czekaj, L., Geoffroy, G.L., Inorg. Chem. 27, 8 (1988).
9. Trent, D.E., Paris, B., Krause, H.H., Inorg. Chem. 3 1057 (1964).
10. Aylett, B.J., Colquhoun, H.M., J. Chem. Soc., Dalton, 1977, 2058.
11. Girolami, G.S., Kaloyeros, A.E., Allocca, C.M., J. Am. Chem. Soc. 109, 1579 (1987).
12. Jensen, J.S., Gozum, J.E., Pollina, D.M., Girolami, G.S., J. Am. Chem. Soc. 110 1643 (1988).
13. Ryabova, L.A., Savitskaya, Ya.S., Thin Solid Films 2, 141 (1968).
14. Fischer, E.O., Inorg. Synth. 7, 136 (1963).
15. Mowat, E., Hill, N.J., Shortland, A.J., Wilkinson, G., J. Chem. Soc., Dalton, 1973, 770.
16. Alyea, E.C., Basi, J.S., Bradley, D.C., Chisholm, M.H., Chem. Comm., 1968, 495.
17. Samsonov, G.V., Vinitskii, I.M., Handbook of Refractory Metal Compounds, (Plenum, New York, 1980), Chapter III, V.
18. Truex, T.J., Saillant, R.B., Monroe, F.M., J. Electrochem. Soc. 122, 1396 (1975).
19. Conner, J.A., Topics in Current Chemistry, 71, 71 (1977).
20. Bercaw, J.E., Marvich, R.H., Bell, L.G., Brintzinger, H.H., J. Am. Chem. Soc. 94, 1219 (1972).
21. Toth, L.E., Transition Metal Carbides and Nitrides, edited by Margrave, J.L. (Refractory Materials, 7, Academic Press, New York, 1971), Chapter V.
22. Girolami, G.S., personal communication, 1987.
23. Davidson, P.J., Lappert, M.F., Pearch, R., Chem. Rev. 76, 219 (1976).
24. Sugiyama, K., Pac, S., Takahashi, Y., Motojima, S., J. Electrochem. Soc. 122, 1545 (1975).
25. Hilton, M.R., Vandentop, G.J., Salmeron, M., Somorjai, G.A., Thin Solid Films 154, 377 (1987).
26. Takahashi, T., Onoyama, N., Ishikawa, Y., Motojima, S., Sugiyama, K., Chem. Lett., 525 (1978).
27. Chase, M.W. Jr, Davis, C.A., Downey, J.R. Jr, Frurip, D.J., McDonald, R.A., Syverud, A.N., JANAF Thermochemical Tables, 3rd ed. (American Chemical Society 14, suppl. 1, 1985).

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Chemical Vapor Deposition of Chromium Carbide from Organometallic Precursors

  • N. M. Rutherford (a1), C. E. Larson (a1) and R. L. Jackson (a1)

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