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Chemical Precursors for GaAs Etching with low Energy ion Beams: Chlorine adsorption on GaAs(100)

  • Richard B. Jackman (a1), Glenn C. Tyrrell (a1), Duncan Marshall (a1), Catherine L. French (a2) and John S. Foord (a2)...

Abstract

This paper addresses the issue of chlorine adsorption on GaAs(100) with respect to the mechanisms of thermal and ion-enhanced etching. The use of halogenated precursors eg. dichloroethane is also discussed in regard to chemically assisted ion beam etching (CAIBE).

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Chemical Precursors for GaAs Etching with low Energy ion Beams: Chlorine adsorption on GaAs(100)

  • Richard B. Jackman (a1), Glenn C. Tyrrell (a1), Duncan Marshall (a1), Catherine L. French (a2) and John S. Foord (a2)...

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