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Chemical Kinetics Models for Semiconductor Processing

  • Michael E. Coltrin (a1), Ellen Meeks (a2), Joseph F. Grcar (a2), William G. Houf (a2), Robert J. Kee (a3) and J. Randall Creighton (a1)...

Abstract

Chemical reactions in the gas-phase and on surfaces are important in the deposition and etching of materials for microelectronic applications. A general software framework for describing homogeneous and heterogeneous reaction kinetics utilizing the Chemkin suite of codes is presented. Experimental, theoretical and modeling approaches to developing chemical reaction mechanisms are discussed. A number of TCAD application modules for simulating the chemically reacting flow in deposition and etching reactors have been developed and are also described.

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1. Kee, R.J., Rupley, F.M., Meeks, E., and Miller, J.A., Sandia National Laboratories Report, SAND96–8216(1996).
2. Gordon, S. and McBride, B. J., NASA SP-273 (1971).
3. Coltrin, M.E., Kee, R.J., Rupley, F.M., and Meeks, E., Sandia National Laboratories Report, SAND96–8217 (1996).
4. Coltrin, M. E., Kee, R. J., and Rupley, F. M., Int. J. Chem. Kinet. 23, 1111 (1991).
5. Kee, R. J., Dixon-Lewis, G., Warnatz, J., Coltrin, M. E., and Miller, J. A., Sandia National Laboratories Report, SAND86–8246 (1986).
6. Creighton, J.R. and Parmeter, J.E., CRC Crit. Rev. Solid State Mat. Sci. 18, 175 (1993).
7. Dubois, L.H., Bent, B.E., and Nuzzo, R.G., in Surface Reactions, Springer Series in Surface Sciences, edited by Madix, R.J. (Springer, Berlin, 1993).
8. Yates, J.T. Jr, in Solid State Physics: Surfaces. Vol. 22, edited by Park, R.L. and Lagally, M.G. (Academic Press, Orlando, 1985) p. 425.
9. White, J.M., Appl. Surface Sci. 26, 392, (1986).
10. Bell, A.T., in Vibrational Spectroscopy of Molecules on Surfaces, edited by Yates, J.T. Jr and Madey, T.E. (Plenum, New York, 1987) p. 105.
11. Hougen, O.A. and Watson, K.M., in Chemical Process Principles. Part 3., Kinetics and Catalysis (Wiley, New York, 1947).
12. Tomkins, F.C., Chemisorption of Gases on Metals (Academic Press, London, 1978), ch. 7.
13. Morris, M.A., Bowker, M., and King, D.A., in Comprehensive Chemical Kinetics. Vol. 19, edited by Bamford, C.H., Tipper, C.F.H., and Compton, R.G. (Elsevier, Amsterdam, 1984), chap. 1.
14. Weinberg, W.H., in Springer Series in Surface Sciences. Vol. 8, edited by Grunze, M. and Kreuzer, H.J. (Springer, Berlin, 1987), p. 84.

Chemical Kinetics Models for Semiconductor Processing

  • Michael E. Coltrin (a1), Ellen Meeks (a2), Joseph F. Grcar (a2), William G. Houf (a2), Robert J. Kee (a3) and J. Randall Creighton (a1)...

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