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Chemical Analyses of Sol/Gel Surfaces and Thin Films

  • Carlo G. Pantano (a1), C. A. Houser (a1) and R. K. Brow (a1)


The application of surface analysis techniques to the characterization of sol/gel surfaces and thin films is described. Secondary-ion mass spectroscopy (SIMS), x-ray photoelectron spectroscopy (XPS) and sputter-induced photon spectroscopy (SIPS) are used to measure the composition of multicomponent silicate films, the relative water content of alumina films, the nitrogen content of ammonia treated silica films, and the depth profiles for films on black chrome. The determination of chemical structure using XPS and SIMS is also discussed. Finally, a brief introduction to temperature-programmed desorption (TPD) and its potential for studying surface chemical reactions, in situ, is presented.



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Chemical Analyses of Sol/Gel Surfaces and Thin Films

  • Carlo G. Pantano (a1), C. A. Houser (a1) and R. K. Brow (a1)


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