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Characterization of Pulsed Supersonic Cvd System For Diamond Growth

Published online by Cambridge University Press:  22 February 2011

Douglas A. A. Ohlberg
Affiliation:
Department of Chemistry and Biochemistry and Solid State Science Center University of California Los Angeles, Los Angeles, CA 90024-1569
James Ren
Affiliation:
Department of Chemistry and Biochemistry and Solid State Science Center University of California Los Angeles, Los Angeles, CA 90024-1569
R.Stanley Williams
Affiliation:
Department of Chemistry and Biochemistry and Solid State Science Center University of California Los Angeles, Los Angeles, CA 90024-1569
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Abstract

An ultra-high vacuum chemical vapor deposition system using pulsed, supersonic jets of halogenated hydrocarbon precursors has been constructed with the intention of growing diamond thin films. Experimental results from this system should determine whether the hyperthermal activation of precursors improves the carbon incorporation efficiency of film growth. The jets, produced by commercially available pulsed valves, were characterized with a fast ionization gauge. Parameters such as valve backing pressure and the pulse width were varied to optimize material flux and avoid the formation of boundary layers above the substrate that could reduce the kinetic energy of the precursors.

Type
Research Article
Copyright
Copyright © Materials Research Society 1994

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References

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