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Characterization of Inconel/Carbon Multilayer Structures

  • J. Liu (a1), Y. Cheng (a2), M. W. Lund (a3), Q. Wang (a3) and A. Higgs (a1)...

Abstract

DC magnetron sputtering technique is used to fabricate inconel/carbon multilayers (ML) for applications in soft x-ray optical systems. The ML films were characterized by small angle x-ray scattering (SAXS), high resolution electron microscopy (HREM) and high-angle annular darkfield (HAADF) microscopy techniques. The HREM showed that the ML films are composed of smooth layers of amorphous components. The HAADF showed strong interdiffusion between inconel and carbon. There is no indication of any pure inconel or carbon regions in the ML films.

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