Plasma enhanced CVD produces carbon layers with various properties which are highly correlated to the different process parameters such as monomer structure, plasma type or plasma power. For example, the modification of monomer (CH4 to C4H10) or the plasma source and the increase of plasma power lead to an optical band-gap which runs from 0.9 to 4.3eV, a conductivity from 5·103 to 5·105S.m−1 and a refractive index from 1.47 to 2.76. Then, it is able to control the optical and electrical film properties from the external process parameters. This paper will thus be focused on the description of relation between deposition parameters, structural characteristics of material and film properties. These materials can then be used for optoelectronics applications.