Hostname: page-component-848d4c4894-4rdrl Total loading time: 0 Render date: 2024-06-22T01:42:25.144Z Has data issue: false hasContentIssue false
  • English
  • Français

Carbon Layer as a New Material for Optics

Published online by Cambridge University Press:  15 March 2011

R. Clergereaux ,
D. Escaich ,
S. Martin ,
P. Raynaud  and
F. Gaillard
R. Clergereaux
Affiliation:
LGET - Material and Plasma Processes 118, Route de Narbonne 31062 TOULOUSE cedex 04 -, France
D. Escaich
Affiliation:
LGET - Material and Plasma Processes 118, Route de Narbonne 31062 TOULOUSE cedex 04 -, France
S. Martin
Affiliation:
CEA - LITEN CEA Grenoble - 17, rue des Martyrs 38054 GRENOBLE cedex 9 -, France
P. Raynaud
Affiliation:
LGET - Material and Plasma Processes 118, Route de Narbonne 31062 TOULOUSE cedex 04 - Franceraynaud@lget.ups-tlse.fr
F. Gaillard
Affiliation:
CEA - LITEN CEA Grenoble - 17, rue des Martyrs 38054 GRENOBLE cedex 9 -, France
Get access

Abstract

Plasma enhanced CVD produces carbon layers with various properties which are highly correlated to the different process parameters such as monomer structure, plasma type or plasma power. For example, the modification of monomer (CH4 to C4H10) or the plasma source and the increase of plasma power lead to an optical band-gap which runs from 0.9 to 4.3eV, a conductivity from 5·103 to 5·105S.m−1 and a refractive index from 1.47 to 2.76. Then, it is able to control the optical and electrical film properties from the external process parameters. This paper will thus be focused on the description of relation between deposition parameters, structural characteristics of material and film properties. These materials can then be used for optoelectronics applications.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 817: Symposium L – New Materials for Microphotonics , 2004 , L6.23
Copyright
Copyright © Materials Research Society 2004

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Grill, A., Thin Solid Films, 355–356, 189 (1999)Google Scholar
2 Martin, S., Clergereaux, R., Escaich, D., Raynaud, P., and Gaillard, F., NEMat Conference, Grenoble (2004)Google Scholar
3 Canillas, A., Polo, M.C., Andujar, J.L., Sancho, J., Bosch, S., Robertson, J., and Milne, W.I., Diam. Relat. Mat., 10, 1132 (2001)Google Scholar
4 Savvides, N., J. Appl. Phys., 59, 4133 (1986)Google Scholar
5 Basu, N., Dutta, J., Chaudhuri, S., Pal, A.K., and Nakayama, M., Vacuum, 47, 233 (1996)Google Scholar