Sublimation growth of AlN was performed on Si-face, 8 ° off-axis 4H-SiC (0001) and 3.5 ° off-axis 6H-SiC (0001) seeds. AlN layers 500 - 900 μm thick and 20 mm in diameter were grown at 1830 °C by consecutive growths and continuous growth. The c-axis growth rate was approximately 8 - 18 μm/hr. On both the 8 ° and 3.5° off-axis SiC substrates, “step” features formed on the AlN surface with uniform terrace width and step density. The step heights and terrace widths increased as the AlN grew thicker. In addition, a single facet of 9 mm × 5 mm formed on the top of the layer grown on the 3.5 ° off-axis SiC. High resolution x-ray diffraction showed the AlN (00.2) 2θ value shifted from pure AlN toward SiC. Approximately 3 – 4 at% of SiC was detected at the surface of the AlN by XPS. Molten KOH/NaOH etching revealed that both samples had Al-polar surface with dislocation densities on the order of 106-107 cm−2. The cross-section etching showed the re-nucleation layer and void defects at the interfaces of the consecutive growths.