Skip to main content Accessibility help

The Benefits of HCl in the Growth of Silicon Nanowires by Chemical Vapour Deposition: Growth of Small Diameter Nanowires and Controlled Facet Evolution

  • Fabrice Oehler (a1), Pascal Gentile (a2), Thierry Baron (a3) and Pierre Ferret (a4)


The effects of hydrogen chloride (HCl) on the growth of silicon nanowires by Chemical Vapour Deposition are investigated. HCl is found to enable the growth of small diameter gold-catalyzed silicon nanowires while reducing the kink occurrence. Specific growth sequences are presented in order to obtain a one-to-one ratio of nanowire growth versus gold colloidal seed. Other growth sequences using HCl are illustrated but achieve mixed results concerning the nanowire structure and the surface state.



Hide All
1 Cui, Y. Zhong, Z. Wang, D. Wang, W. and Lieber, C. Nano Lett., 3, 149152 (2003)
2 Tian, B. Zheng, X. Kempa, T. Fang, Y. Yu, N. Yu, G. Huang, J. and Lieber, C. Nature, 449, 885889 (2007)
3 Kayes, B. Filler, M. Putnam, M. Kelzenberg, M. Lewis, N. and Atwater, H. Appl. Phys. Lett., 91, 103110 (2007)
4 Schmid, H. M.Bjork, T. Knoch, J., Riel, H. Riess, W. Rice, P. and Topuri, T. J. Appl. Phys., 103, 024304 (2008)
5 Oehler, F. Gentile, P. Baron, T. and Ferret, P. Nanotechnology, 20, 475307 (2009)
6 Madras, P. Dailey, E. and Drucker, J. Nano Lett., 9, 11, 38263830 (2009)
7 Tian, B. Xie, P. Kempa, T. Bell, D.C. and Lieber, C. Nat. Nanotechnol., 4, 824829 (2009)



Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed