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The Benefits of HCl in the Growth of Silicon Nanowires by Chemical Vapour Deposition: Growth of Small Diameter Nanowires and Controlled Facet Evolution

  • Fabrice Oehler (a1), Pascal Gentile (a2), Thierry Baron (a3) and Pierre Ferret (a4)

Abstract

The effects of hydrogen chloride (HCl) on the growth of silicon nanowires by Chemical Vapour Deposition are investigated. HCl is found to enable the growth of small diameter gold-catalyzed silicon nanowires while reducing the kink occurrence. Specific growth sequences are presented in order to obtain a one-to-one ratio of nanowire growth versus gold colloidal seed. Other growth sequences using HCl are illustrated but achieve mixed results concerning the nanowire structure and the surface state.

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