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Atomic Layer Deposition on Quantities of Multiwalled Carbon Nanotubes

  • Andrew S. Cavanagh (a1), Christopher A. Wilson (a2), Alan W. Weimer (a3) and Steven M. George (a4)

Abstract

Atomic layer deposition (ALD) was performed on quantities of multiwalled carbon nanotubes (MWCNTs) in a rotary reactor. Because of nucleation difficulties, Al2O3 ALD grew as nanospheres on the MWCNTs. After a NO2 nucleation treatment, Al2O3 ALD films grew conformally and noncovalently functionalized the surface of the MWCNT. This Al2O3 ALD film served as a platform for the growth of W ALD metal. The uncoated and ALD-coated MWCNTs were characterized with transmission electron microscopy and x-ray photoelectron spectroscopy. This study demonstrates that ALD can be performed on quantities of very high surface area MWCNT substrates.

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Keywords

Atomic Layer Deposition on Quantities of Multiwalled Carbon Nanotubes

  • Andrew S. Cavanagh (a1), Christopher A. Wilson (a2), Alan W. Weimer (a3) and Steven M. George (a4)

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