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Atomic Imaging of Metal-Semiconductor Surfaces Using UHV-Hrem and Diffraction

Published online by Cambridge University Press:  21 February 2011

L. D. Marks ,
G. Jayaram ,
R. Plass  and
N. Doraiswamy
L. D. Marks
Affiliation:
Department of Materials Science and Engineering, Northwestern University, Evanston, IL 60208, USA
G. Jayaram
Affiliation:
Department of Materials Science and Engineering, Northwestern University, Evanston, IL 60208, USA
R. Plass
Affiliation:
Department of Materials Science and Engineering, Northwestern University, Evanston, IL 60208, USA
N. Doraiswamy
Affiliation:
Department of Materials Science and Engineering, Northwestern University, Evanston, IL 60208, USA
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Abstract

Recent results about the atomic scale structure of pristine and metal covered, clean semiconductor surfaces using high resolution electron microscopy (HREM) and electron diffraction under ultrahigh vacuum (UHV) conditions are described.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 355: Symposium B1 – Evolution of Thin-Film and Surface Structure and Morphology , 1994 , 181
Copyright
Copyright © Materials Research Society 1995

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References

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