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Anodization of Sputtered Titanium Films

  • Deepak Dhawan (a1), Suresh K. Bhargava (a2), Wojtek Wlodarski (a3) and Kourosh Kalantar-zadeh (a4)

Abstract

Nanoporous Ti (and TiOx) has been formed by anodization of RF sputtered titanium thin films. A solution of 1M (NH4)2SO4 (ammonium sulphate) electrolytes containing 0.5wt% (NH4)F (ammonium fluoride) was used in the anodization process. Different nano and micro structures were obtained. Voltage in a rage of 2 to 10V was employed in the process. It was observed that the magnitude of applied voltage have a significant impact in the formation of different surface morphologies with various nano/micro structures. The anodized titanium thin films were characterised using scanning electron microscopy and X-ray diffraction techniques.

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Anodization of Sputtered Titanium Films

  • Deepak Dhawan (a1), Suresh K. Bhargava (a2), Wojtek Wlodarski (a3) and Kourosh Kalantar-zadeh (a4)

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