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Annealing and Leaching Studies With Natural and Artificial Obsidian Glass

Published online by Cambridge University Press:  28 February 2011

T. D. MÄrk  and
G. Walder
T. D. MÄrk
Affiliation:
Institut für Ionenphysik, Leopold Franzens Universität, Technikerstr. 25, A 6020 Innsbruck, Austria
G. Walder
Affiliation:
Institut für Ionenphysik, Leopold Franzens Universität, Technikerstr. 25, A 6020 Innsbruck, Austria
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Abstract

Annealing kinetics of fission tracks (produced by induced fission of U235 in natural and artificial (doped) obsidian glass has been studied by etching microscopy as a function of annealing time and temperature. The observed annealing characteristics can be best decribed by a two term exponential function with an Arrhenius type temperature dependence of the annealing coefficients. The activation energies deduced are (0.94 ± 0.16)eV and (1.04 ± 0.15)eV for artificial obsidian and (0.83 ± O.13)eV and (0.60 ± 0.16)eV for natural (fossil) obsidian, respectively. In addition, leaching experiments of obsidian samples exposed to different radiation, doses and rates have been made at two different leachate temperatures. At a temperature of 60°C the leaching rate of irradiated samples is much larger than that of unirradiated samples, whereas at a temperature of 90°C observed leaching rates are similar.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 112: Symposium P – Scientific Basis for Nuclear Waste Management XI , 1987 , 693
Copyright
Copyright © Materials Research Society 1988

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