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Analysis of High Dose Implanted Silicon by High Depth Resolution Rbs and Spectroscopic Ellipsometry and TEM

Published online by Cambridge University Press:  25 February 2011

T. Lohner
Affiliation:
Central Research Institute for Physics, Budapest, P.O.B. 49, Hungary
G. Mezey
Affiliation:
Central Research Institute for Physics, Budapest, P.O.B. 49, Hungary
M. Fried
Affiliation:
Central Research Institute for Physics, Budapest, P.O.B. 49, Hungary
L. GhiţA
Affiliation:
Central Institute for Physics, Bucharest, MG 7, Roumania
C. Ghiţa
Affiliation:
Central Institute for Physics, Bucharest, MG 7, Roumania
A. Mertens
Affiliation:
Humboldt University, 1040 Berlin, Invalidenstr. 42, GDR
H. Kerkow
Affiliation:
Humboldt University, 1040 Berlin, Invalidenstr. 42, GDR
E. Kctai
Affiliation:
Central Research Institute for Physics, Budapest, P.O.B. 49, Hungary
F. PÁSzti
Affiliation:
Central Research Institute for Physics, Budapest, P.O.B. 49, Hungary
F. BÁNyai
Affiliation:
Central Research Institute for Physics, Budapest, P.O.B. 49, Hungary
GY. VÍZkelethy
Affiliation:
Central Research Institute for Physics, Budapest, P.O.B. 49, Hungary
E. JÁRoli
Affiliation:
Central Research Institute for Physics, Budapest, P.O.B. 49, Hungary
J. Gyulai
Affiliation:
Central Research Institute for Physics, Budapest, P.O.B. 49, Hungary
M. Somogyi
Affiliation:
Institute for Technical Physics, Budapest, P.O.B. 76, Hungary
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Abstract

One of the applications of high dose ion implantation is to form surface alloys or compound layers. The detailed characterization of such composite structures is of great importance. This paper tries to answer the question: how can we outline, at least, a qualitative picture from the optical properties measured by ellipsometry of high dose Al and Sb implanted silicon. Attempts are done to separate the effect of implanted impurities from the dominant disorder contribution to the measured optical properties. As the ellipsometry does not provide information enough to decide the applicability of optical models therefore methods sensitive to the structure (channeling and TEM) were applied too.

Type
Research Article
Copyright
Copyright © Materials Research Society 1985

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References

REFERENCES

[1] Motooka, T. and Watanabe, K., Journal of Applied Physics, 51, 4125 (1980).Google Scholar
[2] Cortot, j.P. and Ged, Ph., Applied Physics Letters, 41, 93 (1982).Google Scholar
[3] Delfino, M. and Razouk, R.R., J. Electrochemical Soc., 129, 606 (1982).Google Scholar
[4] Paulson, W.M., Wilson, S.R., White, C.W. and Appleton, B.R., in Defects in Semiconductors II (Mat. Res. Soc. Symp. Vol. 14, ed. Mahajan, S. and Corbett, J.W., North-Holland, 1983), 523.Google Scholar
[5] Lohner, T., Mezey, G., Kótai, E., Pászti, F., Manuaba, A. and Gyulai, J., Nucl. Instr. and Meth. 209–210, 615 (1983).Google Scholar
[6] Fried, M., Lohner, T., Jároli, E., Vízkelethy, Gy., Mezey, G., Gyulai, J., Somogyi, M. and Kerkow, H., Thin Solid Films, 116, 191 (1984).Google Scholar
[7] Kusainov, Zh., Mukashev, B.N., Nusupov, K.H., Smirnov, V.V., Proc. Int. Working Meeting on Ion Implantation in Semiconductors and Other Materials, Prague (1981) 19.Google Scholar
[8] Lohner, T., Mezey, G., Kátai, E., Manuaba, A., Pdszti, F., Dévényi, A., and Gyulai, J., Nucl. Instr. Meth., 199, 405 (1982).Google Scholar
[9] Klose, H., Mertens, A., Reetz, R., and Tang, Ng., phys. stat. sol. (a), 77, 233 (1983).Google Scholar
[10] Mezey, G., Kátai, E., Lohner, T., Nagy, T., Gyulai, J. and Manuaba, A., Nucl. Instr. and Meth., 149, 235 (1978).Google Scholar
[11] Ghitá, C., Ghid, L., Baltog, I. and Constantinescu, M., phys. stat. sol. (b), 102, 111 (1980).Google Scholar
[12] Mezey, G., Nagy, T., Gyulai, J., Kátai, E., Manuaba, A. and Lohner, T., in Ion Implantation in Semiconductors, 1976 Ed. Chernow, F., Borders, J.A., and Brice, D.K. (Plenum, 1977) 49.Google Scholar
[13] McCrackin, F.L., NBS Technical Notes 479 (1969).Google Scholar
[14] Aspnes, D.E. and Studna, A.A., Phys. Rev. B, 27, 985 (1983).Google Scholar
[15] Luo, J., McMarr, P.J. and Vedam, K., in Defects in Semiconductors II (Mat. Res. Soc. Symp. Proc. Vol. 14., Ed. Mahajan, S. and Corbett, J.W., North-Holland, 1983), 529.Google Scholar
[16] Namavar, F., Budnick, J.I., Fasihuddin, A., Hayden, H.C., Pease, D.A., Otter, F.A. and Patarini, V., in Ion Implantation and Ion Beam Processing of Materials (Mat. Res. Symp. Proc. Vol. 27, Ed. Hubler, G.K., Holland, O.W., Clayton, C.R. and White, C.W., North-Holland, 1984) 347.Google Scholar