Skip to main content Accessibility help
×
Home

An Environmentally Clean Liquid Precursor of Sulfur for Metalorganic Chemical Vapor Deposition (MOCVD) of Transition Metal Di-Sulfide Thin Films.

  • Prasad N. Gadgil (a1)

Abstract

A three member ring compound propylene sulfide, C3H6S is employed as a sulfur source for the Metalorganic Chemical Vapor Deposition (MOCVD) of stoichiometric thin films of iron pyrite (FeS2). Iron pentacarbonyl Fe(CO)5, a liquid, was precursor for iron. Propylene sulfide, (PS) a liquid ( b. p. = 72–75 °C, v. p. ∼ 87 torr @ 20°C ) decomposes cleanly and quantitatively as S2 and C3H6 (propylene) above 250°C. Deposition of thin films of pyrite and their analysis by X-ray diffraction and Mossbauer and X-ray Photoelectron spectroscopy is described. Liquid state, long term stability, clean and low temperature generation of active S2 species in vapor phase and gaseous by product C3H6 which can be burned to CO2 and H2O are the key advantages offered by propylene sulfide as a sulfur source.

Copyright

References

Hide All
1. Delannay, F., Appl. Catalysis, 116, 135 (1985).
2. Laman, F. C., Matsen, M. W. and Stiles, J. A. R., J. Electrochem. Soc., 133, 2441 (1986).
3. Jellineck, F., in Inorganic Sulfur Chemistry, Nicholas, G. (Ed.), (Elsevier Publishing Corporation, New York, 1968) ch. 19.
4. Iwakura, C., Isobe, N. and Tamura, H., Electrochimica Acta, 28, 269 (1983).
5. Kou, W. W. and Seehra, M. S., Phys. Rev., B, 18,7062 (1978).
6. Shuey, R. T., Semiconducting Ore Minerals, Developments in Economic Geology, Vol.4, (Elsevier, Amsterdam, 1975), p. 304.
7. Ennaoui, A., Hi~pfner, C., Ellmer, K., Fiechter, S. and Tributsch, H., in Proc. Of the 11th E. C. Photovoltaic Solar Energy Conf., Montreux (1992), p. 935.
8. Chatzitheodorou, G., Fiechter, S., Könenkamp, R., Kunst, M., Jaegermann, W. and Tributsch, H., Mater. Res. Bull., 21,1481 (1986).
9. Gadgil, P. N., Ph. D. thesis, Simon Fraser University (1991); P. N. Gadgil, US Patent No. 5 284 519 ( 8 February 1994).
10. Kubaschewaski, O., Iron Binary Phase Diagrams (Springer-Verlag, Berlin 1982), p. 125–28.
11. Rau, H., Kutty, T. R. N. and Carvalho, J. R. F. Gudes, J. Chem. Thermodyn., 5, 8,33, 1973.
12. Benson, S. W., Chem. Rev., 78, 23 (1978).
13. Jones, A. C., J. Crystal Growth, 129, 728(1993).
14. Lown, E. M., Sandhu, H. S., Gunning, H. E. and Strausz, O. P., J. Am. Chem. Soc. 90 (25) 7164 (1968); O. P. Strausz, personal communications.
15. Stull, D. R., Westrum, E. F. Jr., and Sinke, G., in Chemical Thermodynamics of Organic Compounds, (Academic Press, New York, 1970).
16. van der Heide, H., Hemmel, R., van Bruggen, C. P. and Hass, C., J. Solid State Chem., 13, 17 (1980).
17. Seehra, S. S., Montano, P. A., Seehra, M. S. and Sen, S. K., J. Mater. Sci. Lett., 14, 2761 (1979).

Related content

Powered by UNSILO

An Environmentally Clean Liquid Precursor of Sulfur for Metalorganic Chemical Vapor Deposition (MOCVD) of Transition Metal Di-Sulfide Thin Films.

  • Prasad N. Gadgil (a1)

Metrics

Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed.