Hostname: page-component-76fb5796d-2lccl Total loading time: 0 Render date: 2024-04-26T20:57:34.029Z Has data issue: false hasContentIssue false

Amorphous SIC-N Coatings: Its Properties and Applications

Published online by Cambridge University Press:  21 February 2011

Andrew L. Yee
Affiliation:
Department of Materials Science and Engineering, Northwestern University 2225 North Campus Drive, Evanston, IL 60208
Hockchun Ong
Affiliation:
Department of Materials Science and Engineering, Northwestern University 2225 North Campus Drive, Evanston, IL 60208
Fulin Xiong
Affiliation:
Department of Materials Science and Engineering, Northwestern University 2225 North Campus Drive, Evanston, IL 60208
R. P. H. Chang
Affiliation:
Department of Materials Science and Engineering, Northwestern University 2225 North Campus Drive, Evanston, IL 60208
Get access

Abstract

Laser ablation has been used to deposit a:SiC-N films from a CVD SiC target. Depositions were carried out either in vacuum or in a nitrogen ambient ranging from 10 to 100 mT. The mechanical properties of the films versus nitrogen background pressure were assessed using nanoindentation and surface acoustic wave measurements. Deflected optical beam testing, pull testing and atomic force microscopy were used to determine film stress, film-substrate adhesion and film roughness, respectively. The optical properties were also characterized as a function of nitrogen back pressure using spectroscopic ellipsometry which determined refractive indices and predicted film compositions. Fourier transform infrared spectroscopy determined the bonding structures in the films, and finally Rutherford backscattering spectroscopy measurements were also performed. Based on the best mechanical and optical properties, the optimum film deposition conditions were obtained. It was observed that with an increase in nitrogen background pressure, oxygen content in the film, in the form of SiOx, increased significantly affecting the overall properties of the a:SiC-N films.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] Schwan, J., Dworschak, W., Jung, K., and Ehrhardt, H., Diam Rel. Mater. 3, 1034 (1994).Google Scholar
[2] Elhossary, F.M., Fabian, D.J. and Webb, A.P., Thin Solid Films, 192, 201 (1990).Google Scholar
[3] Frauenheim, T., Stephan, U., Bewilogua, K., Jungnickel, F., Blaudeck, P. and Fromm, E., Thin Solid Films, 182, 63 (1989).Google Scholar
[4] Lu, F.X., Yang, B.X., Cheng, D.G., Ye, R.Z., Yu, W.X., Sun, J.B., Thin Solid Films, 212, 220 (1992).Google Scholar
[5] Trakhtenberg, I.S., Plotnikov, S.A., Vladimirov, A.B., Liberman, Y.L., Kanalina, V.A., Boborykin, V.A. and Leizerov, V.M., Diam. Rel. Mater. 2, 1434 (1993).Google Scholar
[6] Kurokawa, H., Yonezawa, T., Mitani, T., IEEE Trans. Magnetics. 23, 2410 (1987).Google Scholar
[7] Xiong, F., Wang, Y.Y., Leppert, V., and Chang, R.P.H., J. Mater. Res. 8, 2265 (1993).Google Scholar
[8] Engineered Materials Handbook, Vol. 4, edited by ASM International (ASM International, Metals Park, OH, 1991).Google Scholar
[9] Kim, J.O. and Achenbach, J.D., Thin Solid Films, 214, 25 (1992).Google Scholar
[10] Ohring, M., The Materials Science of Thin Films (Academic Press, Boston, 1992).Google Scholar
[11] El Khakani, M.A., Chaker, M., Jean, A., Boily, S., Pepin, H., and Kieffer, J.C., J. Appl. Phys. 74, 2834 (1993).Google Scholar
[12] Tompkins, H. G., A User’s Guide to Ellipsometry (Academic Press, Boston, 1993).Google Scholar
[13] Handbook of Optical Constants of Solids, edited by Paulik, E.D. (Academic Press, Orlando, FL, 1985).Google Scholar
[14] Li, J.P., Steckl, A.J., Golecki, I., Reidinger, F., Wang, L., Ning, X.J. and Pirouz, P., Appl. Phys. Lett. 62, 3135 (1993).Google Scholar
[15] Pradham, M.M. and Arora, M., Jpn. J. Appl. Phys. I 31, 176 (1992).Google Scholar
[16] Zhang, B. -R., Yu, Z., Collins, G.J., Hwang, T., Ritchie, W.H., J. Vac. Sci. Technol. A 7, 176 (1989).Google Scholar
[17] Han, H.-X and Feldman, B.J., Solid State Commun. 65, 921 (1988).Google Scholar
[18] Kaye, G.W. and Laby, T.H., Tables of Physical and Chemical Constants, (Longman, London, 1986), p. 225ff.Google Scholar
[19] Boher, P., Renaud, M., van IJzendoorn, L.J., Hily, Y., Appl. Phys. Lett. 54, 511 (1989).Google Scholar