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Alloy Thin Films from Discrete Metallaborane Clusters

Published online by Cambridge University Press:  25 February 2011

T. P. Fehlner ,
M. M. Amini ,
M. V. Zeller ,
W. F. Stickle ,
O. A. PRINGLE ,
G. J. Long  and
F. P. Fehlner
T. P. Fehlner
Affiliation:
Chemistry Department University of Notre Dame, Notre Dame, IN 46556
M. M. Amini
Affiliation:
Chemistry Department University of Notre Dame, Notre Dame, IN 46556
M. V. Zeller
Affiliation:
College of Engineering, University of Notre Dame, Notre Dame, IN 46556 Presently at NASA Lewis Research Center, Cleveland, OH 44135
W. F. Stickle
Affiliation:
Physical Electronic Laboratories, Perkin-Elmer, Mountain View, CA 94043
O. A. PRINGLE
Affiliation:
Departments of Physics and Chemistry, University of Missouri-Rolla, Rolla, MO 65401
G. J. Long
Affiliation:
Departments of Physics and Chemistry, University of Missouri-Rolla, Rolla, MO 65401
F. P. Fehlner
Affiliation:
R.D.&E. Division, Corning Glass Works, Corning, NY 14831
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Abstract

The ferraborane HFe4 (CO)12 BH2 sublimes at 50 °C and decomposes by loss of H2 and CO on various substrate surfaces at 160–180 °C to yield films having metallic appearances with typical thicknesses of 4000Å. These films are amorphous by X-ray, conduct electricity and adhere well to glass, metal and silicon substrates. The composition was determined by ESCA and Auger spectroscopies. The films exhibit highly uniform composition and the Fe/B ratio is 4 showing that film stoichiometry is defined by the cluster core. The ESCA chemical shifts show the presence of boride and metallic iron. At present the bulk film contains a high level of oxygen in the form of iron and boron oxides. No ax-iron is present by X-ray or Mössbauer spectroscopies. Some carbon and hydrogen (SIMS) are present. Mössbauer spectra show the presence of magnetic iron similar to that exhibited by authentic Fe80 B20 samples but the films also contain substantial paramagnetic iron.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 131: Symposium E – Chemical Perspectives of Microelectronic Materials I , 1988 , 413
Copyright
Copyright © Materials Research Society 1989

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References

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