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Total Reflection X-Ray Fluorescence (TXRF)
Published online by Cambridge University Press: 21 February 2011
Abstract
Total reflection X-Ray Fluorescence (TXRF) is a glancing x-ray analytical technique which is used primarily to measure surface metal contamination on semiconductor substrates. This is a review of Total reflection X-Ray Fluorescence (TXRF) applications for silicon semiconductor processing. In addition, some comments are made about the future of TXRF, and in particular, synchrotron radiation TXRF (SR-TXRF)
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- Copyright © Materials Research Society 1995
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