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A Three-phase Model for the Structure of Porous Thin Films Determined by X-ray Reflectivity and Small-Angle Neutron Scattering

Published online by Cambridge University Press:  17 March 2011

Wen-li Wu ,
Eric K. Lin ,
Changming Jin  and
Jeffrey T. Wetzel
Wen-li Wu
Affiliation:
Polymers Division, Materials Science and Engineering Laboratory National Institute of Standards and Technology 100 Bureau Drive, Stop 8541, Gaithersburg, MD 20899-8541, USA
Eric K. Lin
Affiliation:
Polymers Division, Materials Science and Engineering Laboratory National Institute of Standards and Technology 100 Bureau Drive, Stop 8541, Gaithersburg, MD 20899-8541, USA
Changming Jin
Affiliation:
SEMATECH 2706 Montopolis Drive, Austin, TX 78741-6499, USA
Jeffrey T. Wetzel
Affiliation:
SEMATECH 2706 Montopolis Drive, Austin, TX 78741-6499, USA
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Abstract

A methodology to characterize nanoporous thin films based on a novel combination of high-resolution specular x-ray reflectivity and small-angle neutron scattering has been advanced to accommodate heterogeneities within the material surrounding nanoscale voids. More specifically, the average pore size, pore connectivity, film thickness, wall or matrix density, coefficient of thermal expansion, and moisture uptake of nanoporous thin films with non-homogeneous solid matrices can be measured. The measurements can be performed directly on films up to 1.5 µm thick while supported on silicon substrates. This method has been successfully applied to a wide range of industrially developed materials for use as low-k interlayer dielectrics.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 612: Symposium D – Materials, Technology & Reliability for Advanced Interconnects.. , 2000 , D5.22.1
Copyright
Copyright © Materials Research Society 2000

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