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Thermal Stabilization and Crystallization of Nanometric Particles of Si-C-N Produced by RF-Plasma Enhanced Chemical-Vapor-Deposition

Published online by Cambridge University Press:  17 March 2011

Gregorio Viera ,
Enric Bertran ,
Mari C. Polo ,
Enric Garcia-Caurel ,
Jordi Farjas  and
Pere Roura
Gregorio Viera
Affiliation:
GRM, Dept. de Física, Universitat de Girona, E17071 Girona, Spain
Enric Bertran
Affiliation:
GRM, Dept. de Física, Universitat de Girona, E17071 Girona, Spain
Mari C. Polo
Affiliation:
GRM, Dept. de Física, Universitat de Girona, E17071 Girona, Spain
Enric Garcia-Caurel
Affiliation:
GRM, Dept. de Física, Universitat de Girona, E17071 Girona, Spain
Jordi Farjas
Affiliation:
GRM, Dept. de Física, Universitat de Girona, E17071 Girona, Spain
Pere Roura
Affiliation:
FEMAN, Dep. Física Aplicada i Òptica, Universitat de Barcelona. E08028 Barcelona, Spain
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Abstract

Nanoparticles of Si-alloys were grown at room temperature in a RF-PECVD process from mixtures of SiH4, CH4 and NH3. Quasi-monodisperse nanoparticles were produced in conditions of fast particle development. Among the different conditions for particle formation, we chose moderate low pressure (below 100Pa) and RF-power lower than 200W in all cases. The particle size was controlled through the modulation of the RF power supplied to the discharge. A post-thermal treatment at 800-900°C was used to eliminate the hydrogen of the particles and to stabilize them against environmental oxidation. To study the thermal crystallization of the particles, various thermal-treatments were used. The annealing of these particles at 1400°C for one hour under Ar or N2 led to different results depending on the composition of the samples as revealed by HRTEM and electron-diffraction analysis: SiC particles showed a marked internal crystallization; SiCN particles developed nanocrystals embedded in their amorphous matrix; Si particles crystallized in diamond-like silicon when annealed in Ar, whereas long whiskers of the α-Si3N4 phase, 50-200nm wide, grew from the particles in N2.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 609: Symposium A – Amorphous & Heterogeneous Silicon Thin Films – 2000 , 2000 , A24.5
Copyright
Copyright © Materials Research Society 2000

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References

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