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Terraced Copper Growth Deposited Onto Teflon AF1600 by The Excimer Laser Irradiation of Cu(hfac)Tmvs
Published online by Cambridge University Press: 15 February 2011
Abstract
The laser chemical vapour deposition (LCVD) of the organometallic precursor Cu(hfac)TMVS (hexafluoroacetylacetonate)(trimethylvinylsilane) is used to grow copper films on a Teflon AF1600 substrate. Exposure to excimer laser radiation at 248 nm results in a terraced copper growth. A simple model, based on interference effects in the Teflon and copper layers, is presented to account for this structure.
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- Copyright © Materials Research Society 1996
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