Published online by Cambridge University Press: 15 March 2011
The non-catalytical chemical vapor deposition (CVD) method was used to grow carbon thin film material consisting of plate-like nanosized graphite crystallites and multiwall carbon nanotubes with predominant orientation of both species by their crystallographic plane, corresponding to a graphite basal plane, along a normal to the film surface. A number of experimental techniques was used for examination and characterization of the film phase composition, morphology, and electron properties peculiarities. Low-field electron emission with highly density of emission sites and emission current was obtained for the film material and allow to demonstrate their applicability for sealed prototypes of light-emitting devices.
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