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Surface Characteristics Of Quasicrystalline Materials: An Overview Of Work Conducted At Ames Laboratory

Published online by Cambridge University Press:  10 February 2011

C. J. Jenks*
Affiliation:
Ames Laboratory, Iowa State University, Ames, IA 50011 USA
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Abstract

Over the last few years, work in our laboratories in Ames has focussed on elucidating the surface characteristics of Al-based quasicrystalline materials, namely icosahedral (i-) Al-Cu-Fe and i-Al-Pd-Mn. Our work involves the study of the clean surfaces of these materials under ultrahigh vacuum conditions. We find that surfaces cleaned by Ar+ sputtering are depleted in Al relative to the bulk composition. Single grains, after sputtering, undergo a two-stage regrowth process as they are annealed. After heating to about 600 K, a crystalline overlayer is formed. This is rather abruptly replaced at about 750 K by a surface that appears quasicrystalline within the resolution of the experimental techniques used. Calculations based on low-energy electron diffraction (LEED) measurements of this higher temperature state indicate that the Al-rich layers in the bulk model of these materials are the favored surface terminations. Results of low-energy ion scattering (LEIS) corroborate this finding. Consistent with this, we find that the oxidation behavior and general reactivity of these materials are analogous to pure Al.

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

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References

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