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Study of Titanium Nitrides Synthesized by High Dose Ion Implantation

Published online by Cambridge University Press:  21 February 2011


M. Guemmaz
Affiliation:
IPCMS-GSI, 23 roe du Loess, F-67037 STRASBOURG Cedex, France
A. Mosser
Affiliation:
IPCMS-GSI, 23 roe du Loess, F-67037 STRASBOURG Cedex, France
D. Raiser
Affiliation:
IPCMS-GSI, 23 roe du Loess, F-67037 STRASBOURG Cedex, France
J.J. Grob
Affiliation:
PHASE, 23 rue du Loess, F-67037 STRASBOURG Cedex, France
A. Cornet
Affiliation:
ENSAIS-LMCM, 24 boulvard de la Victoire, F-67000 STRASBOURG, France
S. Paletto
Affiliation:
INSA-GEMPPM, 20 avenue Albert Einstein, F-69621 VILLEURBANNE Cedex, France

Abstract

Polycrystalline titanium samples were implanted with N+ ions at high fluences and at several energies. The aim was to obtain 4000 Â thick nitrided layers of constant nominal concentration equal to 20% ,30%, and 40%.

The results obtained by RBS showed a flat nitrogen distribution with depth and the measured concentrations were respectively 20%,31% and 38%.

X-ray grazing incidence diffraction indicated that, at 20%, a nitrogen solid solution is formed in the a-Ti matrix. At 31% the nitrogen solid solution is present besides a 5-TiN phase and at 38% only the 5-TiN phase remains.

From nanoindentation measurements, we derived the depth-related hardness and Young's modulus of the implanted samples. These values were compared to those found on titanium nitride layers obtained with other coating techniques.


Type
Research Article
Copyright
Copyright © Materials Research Society 1995

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