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Structural Effects of Radiation Damage in Silica Based Glasses

Published online by Cambridge University Press:  15 February 2011

A. Manara
Affiliation:
Joint Research Centre, 21020 Ispra (Varese), Italy
P.N Gibson
Affiliation:
Joint Research Centre, 21020 Ispra (Varese), Italy
M. Antonini
Affiliation:
Istituto di Fisica and GNSM, Universita' di Modena, 41100 Modena, ITALY
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Abstract

The results of recent measurements of optical absorption, etching rate and transmission electron microscopy in pure silica and borosilicate glasses are reported and discussed. At dose saturation conditions, the dependence of the optical density associated with the production of single atomic defects from the mass of the impinging particle shows a marked saturation at masses ≥ 20 amu. The corresponding etching rates increase by about 4 times with respect to unirradiated samples. In borosilicate glasses, the temperature dependence of the threshold dose rate of electrons to initiate the nucleation of bubbles shows a marked increase from about 300° to 600° K.

Type
Research Article
Copyright
Copyright © Materials Research Society 1982

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References

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