Hostname: page-component-84b7d79bbc-lrf7s Total loading time: 0 Render date: 2024-07-30T06:12:03.308Z Has data issue: false hasContentIssue false

Selective Etching and Photo—Bleaching in Thin Amorphous Ge—Sb—S Films

Published online by Cambridge University Press:  21 February 2011

Evdokia B. Savova
Affiliation:
Institute of solid state physics, 1784 Sofia, 72 Lenin blvd., Bulgaria
B.I. Pashmakoff
Affiliation:
Institute of solid state physics, 1784 Sofia, 72 Lenin blvd., Bulgaria
Get access

Abstract

A mechanism is proposed for the selective etching effects in thin amorphous Ge—Sb—S films based on the combined action of photostructural changes and alkaline solvent with a surface active substance. Evidence is given in support of the assertion thatthe same photostructural changes (namely, the breaking of Ge—Sb bonds under the action of UV light) are responsible for the irreversible photo—bleaching of these layers. Four different compositions in the system Ge—Sb—S have been studied under different preparation conditions (thermal evaporation and laser—beam sputtering).Photostructural changes were induced by UV light irradiation. Infrared spectra of the layers are presented in support of the proposed model.

Type
Research Article
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Frumar, M., Ticha, H., Vlcek, M., Klikorka, J., Czech. J. Phys. B 31, 441 (1981).Google Scholar
2. Vateva, E., Nickiphorova, M., Skordeva, E., Bulg. Patent No. 69799.Google Scholar
3. Lucovsky, G., Galeener, F.L., Keezer, R.C., Geils, R.H., Six, H.A., Phys. Rev. B 10, 5134 (1974).Google Scholar
4. Zacharov, Gerasimenko, Structura Amorfnich Poluprovodnikov, Kiev, 1976 (in Russian).Google Scholar
5. Brodsky, M.H., Amorphous Semiconductors, (New York, 1979), p. 288.Google Scholar
6. Tronc, P., Bensoussan, M., Brenac, A., Phys. Rev. B 8, 5947 (1973).Google Scholar
7. Lucovsky, G., deNeufville, J.P., Galeener, F.L., Phys. Rev. B 9, 1591 (1974).Google Scholar
8. Tichy, L., Ticha, H., Frumar, M., Klikorka, J., Triska, A., Barta, C., Nemeckova, A., Czech. J. Phys. B 32, 1363 (1982)Google Scholar