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Potential Driven Chemical Expansion of La0.6Sr0.4Co1-xFexO3-δ Thin Films on Yttria Stabilized Zirconia

Published online by Cambridge University Press:  18 February 2013

Kee-Chul Chang
Affiliation:
Materials Science Division, Argonne National Laboratory, 9700 S Cass Ave., Argonne, IL 60439, U.S.A
Brian J. Ingram
Affiliation:
Chemical Sciences and Engineering Division, Argonne National Laboratory, 9700 S Cass Ave., Argonne, IL 60439, U.S.A
E. Mitchell Hopper
Affiliation:
Chemical Sciences and Engineering Division, Argonne National Laboratory, 9700 S Cass Ave., Argonne, IL 60439, U.S.A
Miaolei Yan
Affiliation:
Department of Materials Science and Engineering, Carnegie Mellon University, Pittsburgh, 5000 Forbes Ave., Pittsburgh, PA 15213, U.S.A
Paul Salvador
Affiliation:
Department of Materials Science and Engineering, Carnegie Mellon University, Pittsburgh, 5000 Forbes Ave., Pittsburgh, PA 15213, U.S.A
Hoydoo You
Affiliation:
Materials Science Division, Argonne National Laboratory, 9700 S Cass Ave., Argonne, IL 60439, U.S.A
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Abstract

To better understand the response of oxygen vacancy concentration to applied potential, the lattice parameter of pulsed laser deposited La0.6Sr0.4Co1-xFexO3-δ thin films was monitored using in situ X-ray diffraction. We demonstrate that the chemical expansion under applied potential depends on the cathode morphology, which determines the contribution of different reaction pathways. We investigated applied potential dependent lattice expansion on La0.6Sr0.4Co1-xFexO3-δ with 3 different Co:Fe ratios in an attempt to connect bulk chemical expansion data to thin films. We find that the chemical expansion trends in thin films are different than expected from bulk data.

Type
Articles
Copyright
Copyright © Materials Research Society 2013 

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References

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