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Plasma-Assisted MOCVD Growth of ZnO Thin Films

Published online by Cambridge University Press:  01 February 2011

Maria Losurdo ,
Maria Michela Giangregorio ,
Pio Capezzuto ,
Giovanni Bruno ,
Graziella Malandrino ,
Manuela Blandino  and
Ignazio Fragalà
Maria Losurdo
Affiliation:
maria.losurdo@ba.imip.cnr.it, IMIP-CNR, PLASMACHEMISTRY, VIA ORABONA 4, BARI, BARI, 70125, Italy, +39.0805443562, +39.0805442024
Maria Michela Giangregorio
Affiliation:
michelaria.giangregorio@ba.imip.cnr.it
Pio Capezzuto
Affiliation:
pio.capezzuto@ba.imip.cnr.it, IMIP-CNR, PLASMACHEMISTRY, Italy
Giovanni Bruno
Affiliation:
giovanni.bruno@ba.imip.cnr.it, IMIP-CNR, PLASMACHEMISTRY, Italy
Graziella Malandrino
Affiliation:
gmalandr@mbox.unict.it, Universita di Catania, Chemistry, Italy
Manuela Blandino
Affiliation:
gmalandr@mbox.unict.it, Universita di Catania, Chemistry, Italy
Ignazio Fragalà
Affiliation:
gmalandr@mbox.unict.it, Universita di Catania, Chemistry, Italy
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Abstract

ZnO thin films have been grown by metalorganic chemical vapor deposition (MOCVD) also plasma assisted (PA-MOCVD) on c-axis oriented sapphire (0001) and Si(001) substrates using the alternative Zn(TTA)2·tmed (HTTA=2-thenoyltrifluoroacetone,TMED=N,N,N’,N’-tetramethylethylendiamine) precursor. The structural, morphological and optical properties of ZnO films have been investigated. The results show that the O2 plasma assisted growth results in an improvement of the structure, in smoother morphologies and in a better optical quality with a sharp and intense exciton of ZnO films.

Keywords

plasma-enhanced CVD (PECVD) (deposition)II-VIoptical properties
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 892 , 2005 , 0892-FF18-06-EE09-06
Copyright
Copyright © Materials Research Society 2006

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References

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