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Plasma Ion Implantation for Flat Panel Displays
Published online by Cambridge University Press: 03 September 2012
Abstract
Development of ion doping and hydrogenation equipment using plasma ion implantation (PII) is being studied. It is shown that low energy, high throughput operation could eliminate problems associated with etching, charging, cooling, and contamination. The applications of a new plasma source and neural network implementation optimization are also reported.
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- Research Article
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- Copyright © Materials Research Society 1997
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