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Photolithographic Process Based on High Contrast Acrylate Photoresist for Multi-Protein Patterning

Published online by Cambridge University Press:  01 February 2011

Margarita Chatzichristidi ,
Panagiota S. Petrou ,
Antonios M. Douvas ,
Constantinos D. Diakoumakos ,
Ioannis Raptis ,
Konstantinos Misiakos ,
Sotirios S. Kakabakos  and
Panagiotis Argitis
Margarita Chatzichristidi
Affiliation:
argitis@imel.demokritos.gr, National Center of Scientific Research “Demokritos”, Microelectronis, Terma Patriarchou Grigoriou, Aghia Paraskevi, 15310, Athens, Athens, 15310, Greece, +30-210-6503114
Panagiota S. Petrou
Affiliation:
ypetrou@rrp.demokritos.gr, NCSR Demokritos, Institute of Radioisotopes and Radiodiagnostics Products, Aghia Paraskevi, Athens, 15310, Greece
Antonios M. Douvas
Affiliation:
adouvas@imel.demokritos.gr, NCSR Demokritos, Inst of Microelectronics, Aghia Paraskevi, Athens, 15310, Greece
Constantinos D. Diakoumakos
Affiliation:
macromolar@yahoo.co.uk, NCSR Demokritos, Inst of Microelectronics, Aghia Paraskevi, Athens, 15310, Greece
Ioannis Raptis
Affiliation:
raptis@imel.demokritos.gr, NCSR Demokritos, Inst of Microelectronics, Aghia Paraskevi, Athens, 15310, Greece
Konstantinos Misiakos
Affiliation:
misiakos@imel.demokritos.gr, NCSR Demokritos, Inst of Microelectronics, Aghia Paraskevi, Athens, 15310, Greece
Sotirios S. Kakabakos
Affiliation:
skakab@rrp.demokritos.gr, NCSR Demokritos, Institute of Radioisotopes and Radiodiagnostics Products, Aghia Paraskevi, Athens, 15310, Greece
Panagiotis Argitis
Affiliation:
argitis@imel.demokritos.gr, NCSR Demokritos, Inst of Microelectronics, Aghia Paraskevi, Athens, 15310, Greece
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Abstract

Continuing the effort of our group for biocompatible, photoresist-based lithographic processes, high contrast near UV photoresists are presented along with a novel multi-step lithographic scheme. The proposed lithographic scheme is based on successive lithographic steps (exposure at 310 nm) on the same substrate for the patterning of different proteins. The photoresists are based on (meth)acrylate tetrapolymers and a near UV sensitive sulfonium salt as photoacid generator and can be processed under mild baking and development conditions allowing patterning of proteins without denaturation and loss of their molecular recognition capability. Protein patterning in successive lithographic steps down to 2μm has been achieved. Sub-1μm patterning structures have been also obtained. Lithographic results were evaluated with SEM and fluorescence microscopy, after the recognition of the patterned biomolecules by their fluorescently labeled counterparts.

Keywords

lithography (deposition)biomaterialpolymer
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 950: Symposium D – Biosurfaces and Biointerfaces , 2006 , 0950-D15-15
Copyright
Copyright © Materials Research Society 2007

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References

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