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More Insight into the VHF-Glow-Discharge by Plasma Impedance Measurements

Published online by Cambridge University Press:  16 February 2011

U. Kroll ,
Y. Ziegler ,
J. Meier ,
H. Keppner  and
A. Shah
U. Kroll
Affiliation:
Institut de Microtechnique, Université de Neuchâtel, CH-2000 Neuchâtel, Switzerland
Y. Ziegler
Affiliation:
Institut de Microtechnique, Université de Neuchâtel, CH-2000 Neuchâtel, Switzerland
J. Meier
Affiliation:
Institut de Microtechnique, Université de Neuchâtel, CH-2000 Neuchâtel, Switzerland
H. Keppner
Affiliation:
Institut de Microtechnique, Université de Neuchâtel, CH-2000 Neuchâtel, Switzerland
A. Shah
Affiliation:
Institut de Microtechnique, Université de Neuchâtel, CH-2000 Neuchâtel, Switzerland
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Abstract

We performed plasma impedance measurements at room temperature for a hydrogen plasma using an impedance analyser. The plasma excitation frequency range spans from 40 to 70 MHz. Both the real and imaginary part of the impedance decrease monotonously with increasing frequency. These measurements are in agreement with prior experimental observations [1], that the required peak-to-peak voltage between the electrodes is reduced at higher excitation frequencies. Using a simple equivalent circuit for the plasma this effect can be mainly attributed to the increased sheath capacitance. Furthermore, by modelling the sheath with a simple parallel plate capacitor, its thickness could be estimated: it decreases from 2 MM at 40 MHz to about 1.4 MM at 70 MHz plasma excitation frequency. Finally, a possible link between the decreasing sheath thickness on the increase of deposition rate is discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 336: Symposium A – Amorphous Silicon Technology - 1994 , 1994 , 115
Copyright
Copyright © Materials Research Society 1994

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References

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