Hostname: page-component-77c89778f8-m42fx Total loading time: 0 Render date: 2024-07-18T06:19:18.160Z Has data issue: false hasContentIssue false

Microwave Tuning Quality and Power Handling of Voltage-Tunable Capacitors: Semiconductor Varactors Versus Ba1−xSrxTiO3 Films

Published online by Cambridge University Press:  10 February 2011

D. Gait
Affiliation:
SCT, Inc., 720 Corporate Circle, Golden, CO 80401, galt@reachsct.com
T. Rivkina
Affiliation:
SCT, Inc., 720 Corporate Circle, Golden, CO 80401, galt@reachsct.com
M. W. Cromar
Affiliation:
SCT, Inc., 720 Corporate Circle, Golden, CO 80401, galt@reachsct.com
Get access

Abstract

Thin films of SrTiO3 and Ba0.4Sr0.6TiO3 have been pulse laser ablated onto LaAIO3 substrates. Normal metal coplanar capacitor electrodes were patterned on top of these films and the capacitors were incorporated into weakly coupled microstrip resonators. Resonant frequencies and Q's were measured as a function of bias at room temperature and at 77 K. The microwave frequency capacitance and loss is calculated from the resonant properties and compared with the simultaneously measured 1 MHz capacitance and dissipation. Two-tone intermodulation distortion products were measured and the third-order intercept is referenced to the microwave voltage across the capacitors. Commercially available semiconductor varactors were tested in a similar manner. The tuning quality (the ratio of the relative capacitance tuning to dissipation), frequency dispersion, and power handling of these capacitors are compared. Although there appears to be no intrinsic power handling advantage of the paraelectrics over the semiconductor varactors, the paraelectric varactors can offer better tuning quality.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. DeGroot, D.C., Beall, J. A., Marks, R. B., Rudman, D. A., Trans. Appl. Superconductivity, 5, 2272 (1995).Google Scholar
2. Carroll, K. R., Pond, J. M., Chrisey, D. B., Horwitz, J. S., Leuchtner, R. E., and Grabowski, K. S., Appl. Phys. Lett., 62, 1845 (1993).Google Scholar
3. Beall, J. A., Ono, R. H., Galt, D., Price, J. C., 1993 IEEE MTT-S Int. Microwave Symp. Dig. 1421 (1993).Google Scholar
4. Galt, D., Price, J. C., Beali, J. A., Ono, R. H., Appl. Phys. Lett., 63, 3078 (1993).Google Scholar
5. Galt, D., Price, J. C., Beall, J. A., Harvey, T. E., IEEE Trans. Appl. Superconductivity, 5, 2575 (1995).Google Scholar
6. Kozyrev, A. B., Keis, V. N., Koefp, G., Yandrofski, R., Soldantenkov, O. I., Dudin, K. A., and Dovgan, D. P., Microelectronic Engineering, 29, 257 (1995).Google Scholar
7. Findikoglu, A. T., Jia, Q. X., Wu, X. D., Chen, G. J., Venkatesan, T., Reagor, D. W., Appl. Phys. Lett., 68, 1651 (1996).Google Scholar
8. Krupka, J., Geyer, R. G., Kuhn, M., Hinken, J. H., IEEE Trans. Microwave Theory Tech., 42, 1886(1994).Google Scholar
9. Gupta, K. C., Garg, R., Bahl, I., Bhartia, P., Microstrip Lines and Slotlines, 2nd ed., (Artech, Boston, 1996), pp. 810.Google Scholar
10. Kozyrev, A. B., Samoilova, T. B., Golovkov, A. A., Hollmann, E. K., Kalinikos, D. A., Loginov, V. E., Prudan, A. M., Soldantenkov, O. I., Mueller, C. H., Rivkin, T. V., Koepf, G. A., proceedings of the 9th ISIF to be published in Integ. Ferroelectrics.Google Scholar
11. Vendik, O. G., private communication (1993).Google Scholar
Vendik, O. G., Ter-Martirosyan, L. T., Dedyk, A. I., Karmanenko, S. F., and Chakalov, R. A., Ferroelectrics, 144, 33 (1993).Google Scholar
12. Galt, D., Ph.D. Thesis, University of Colorado, Boulder, Dept. of Phys., (1996).Google Scholar
13. Oates, D. E. and Dionne, G. F., 1997 IEEE MTT-S Digest, 303 (1997).Google Scholar
14. Dalberth, M. J., Stauber, R. E., Price, J. C., Rogers, C. T., Galt, D. in Epitaxial Oxide Thin Films III edited by Schlom, D. G., Eom, C.-B., Hawley, M. E., Foster, C. M., Speck, J. S. (Mater. Res. Soc. Proc., 474, Pittsburgh, PA 1997), pp. 4348.Google Scholar
15. Mortenson, K. E., Variable Capacitance Diodes, (Artech, Dedham, 1974), p. 47.Google Scholar