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Metallurgical Reactions in Au/(In–Ge) Ohmic Contacts to GaAs

Published online by Cambridge University Press:  15 February 2011

C. R. M. Grovenor*
Affiliation:
IBM Thomas J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY 10598, (U.S.A.)
*
Permanent address: Department of Metallurgy and Science of Materials, Parks Road, Oxford OX1 3PH, Gt., Britain.
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Abstract

The Au/(In–Ge) contact to GaAs was investigated to discover the metallurgical structure of the contact–GaAs interface. A variety of intermetallic phases in the form of precipitate particles or thin films were identified, and their presence was correlated with the temperature at which the contacts were fired. The possibility of predicting the structures of the fired contacts from simple metallurgical phase diagrams is discussed, and some evidence on the influence of the precipitating phases on the electrical character of the contacts is reviewed.

Type
Research Article
Copyright
Copyright © Materials Research Society 1982

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References

REFERENCES

1 Braslau, N., Gunn, J. B. and Staples, J. L., Solid-State Electron., 10 (1967) 381.CrossRefGoogle Scholar
2 Hasty, T. E., Stratton, R. and Jones, E. L., J. Appl. Phys., 30 (1968) 4623.CrossRefGoogle Scholar
3 Andrews, A. M. and Holonyak, N. Jr., Solid-State Electron., 15 (1972) 601.CrossRefGoogle Scholar
4 Heiblum, M., Nathan, M. I. and Chang, C. A., Solid-State Electron., 15 (1972) 601.Google Scholar
5 Wittmer, M., Pretorius, R., Mayer, J. W. and Nicolet, M.-A., Solid-State Electron., 20 (1977) 433.CrossRefGoogle Scholar
6 Madams, C. J., Morgan, D. V. and Howes, M. J., Electron. Lett., 12 (1978) 98.Google Scholar
7 Ogawa, M., J. Appl. Phys., 51 (1980) 406.CrossRefGoogle Scholar
8 Christou, A., Solid-State Electron., 22 (1979) 151.Google Scholar
9 Kinsbron, E., Gallagher, P. K. and English, A. T., Solid-State Electron., 22 (1979) 517. CrossRefGoogle Scholar
10 Kumar, K., Jpn. J. Appl. Phys., 18 (1979) 713.CrossRefGoogle Scholar
11 Butlin, R., The Plessey Co., personal communication, 1978.Google Scholar
12 Millar, D. C., J. Electrochem. Soc., 127 (1980) 467.CrossRefGoogle Scholar
13 Rackham, G. M. and Steeds, J. W., in Developments in Electron Microscopy and Analysis, Inst. Phys. Conf. Ser. 36 (1977) 297.Google Scholar
14 Rackham, G. M. and Steeds, J. W., Rep. on CVD, 1977–1978 (University of Bristol) (Project RU41–4).Google Scholar
15 Grovenor, C. R. M., D. Phil. Thesis, University of Oxford, 1980.Google Scholar
16 Rackham, G. M. and Steeds, J. W., in Electron Diffraction, Inst. Phys. Conf. Series 41 (1978) 178.Google Scholar
17 Anatharaman, T. R., Luo, H. L. and Klement, W., Trans. Metall. Soc. AIME, 233 (1965) 2104.Google Scholar
18 Loveluck, J. E., Rackham, G. M. and Steeds, J. W., Rep. on CVD, 1976–1977 (University of Bristol) (Project RU41–4).Google Scholar