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MRS Online Proceedings Library (OPL) MRS Online Proceedings Library (OPL)

Article contents

Metal Organic Chemical Vapor Deposition of Zinc Oxide

Published online by Cambridge University Press:  01 February 2011

William E. Fenwick ,
Vincent T. Woods ,
Ming Pan ,
Nola Li ,
Matthew H. Kane ,
Shalini Gupta ,
Varatharajan Rengarajan ,
Jeff Nause  and
Ian T. Ferguson
William E. Fenwick
Affiliation:
fenwick@ece.gatech.edu, Georgia Institute of Technology, Electrical Engineering, United States
Vincent T. Woods
Affiliation:
vwoods@ece.gatech.edu, Georgia Institute of Technology, Electrical Engineering, United States
Ming Pan
Affiliation:
mpan@cermetinc.com, Cermet Inc, United States
Nola Li
Affiliation:
nola@ece.gatech.edu, Georgia Institute of Technology, Electrical Engineering, United States
Matthew H. Kane
Affiliation:
mhkane@ece.gatech.edu, Georgia Institute of Technology, Materials Science and Engineering, United States
Shalini Gupta
Affiliation:
guptasha@ece.gatech.edu, Georgia Institute of Technology, Electrical Engineering, United States
Varatharajan Rengarajan
Affiliation:
vrajan@cermetinc.com, Cermet Inc, United States
Jeff Nause
Affiliation:
jnause@cermetinc.com, Cermet Inc, United States
Ian T. Ferguson
Affiliation:
ianf@ece.gatech.edu, Georgia Institute of Technology, Electrical Engineering, United States
Corresponding
E-mail address:
fenwick@ece.gatech.edu
vwoods@ece.gatech.edu
mpan@cermetinc.com
nola@ece.gatech.edu
mhkane@ece.gatech.edu
guptasha@ece.gatech.edu
vrajan@cermetinc.com
jnause@cermetinc.com
ianf@ece.gatech.edu
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Abstract

Thin films of ZnO were grown by metal organic chemical vapor deposition (MOCVD) in a vertical injection rotating disk reactor (RDR) system on sapphire substrates. Kinetics of ZnO growth by MOCVD were studied and an optimal growth window for a RDR tool was determined. Experimental growth conditions were chosen based on calculations of Reynolds Number (Re) and mixed convection parameter in order to select a growth window with stable gas flow and uniform heat transfer. Growth parameters were systemically varied within this window to determine the optimal growth conditions for this MOCVD tool and to study how these parameters affect film growth and quality. Properties of ZnNiO films grown by MOCVD were also studied to determine the effects of Ni incorporation on structural, optical, and magnetic properties.

Keywords

metalorganic deposition kinetics crystal growth
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 892 , 2005 , 0892-FF18-07-EE09-07
Copyright
Copyright © Materials Research Society 2006

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References

1 Yu, S. F., Clement, Yuen, Lau, S. P. et al. , “Zinc oxide thin-film random lasers on silicon substrate,” Applied Physics Letters 84 (17), 3244–3246 (2004).CrossRefGoogle Scholar
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