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Magnetic Anisotropy of FeAlSi Sputtered Films

Published online by Cambridge University Press:  15 February 2011

Toshihiko Ohta ,
Yuichi Ohsawa  and
Hitoshi Iwasaki
Toshihiko Ohta
Affiliation:
Research and Development Center, Toshiba Corporation, 1 Komukai Toshiba-cho, Saiwai-ku 210, Japan
Yuichi Ohsawa
Affiliation:
Research and Development Center, Toshiba Corporation, 1 Komukai Toshiba-cho, Saiwai-ku 210, Japan
Hitoshi Iwasaki
Affiliation:
Research and Development Center, Toshiba Corporation, 1 Komukai Toshiba-cho, Saiwai-ku 210, Japan
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Abstract

The FeAlSi film magnetic anisotropy has been studied in relation to the residual stress and crystalline orientation. Experiments show that the magnetic anisotropy behavior depends on the geometrical location of the substrate with the target during the deposition. The main origin of the magnetic anisotropy is attributable to the magnetoelastic effect due to the residual stress anisotropy, which may be induced by the anisotropic incidence of sputtered particles to the substrate.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 232: Symposium T – Magnetic Materials: Microstructure and Properties , 1991 , 237
Copyright
Copyright © Materials Research Society 1991

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References

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