Hostname: page-component-84b7d79bbc-5lx2p Total loading time: 0 Render date: 2024-07-30T11:14:34.573Z Has data issue: false hasContentIssue false
  • English
  • Français

Low Temperature Deposited High Quality ITO Films Prepared by E-Beam Evaporation

Published online by Cambridge University Press:  21 February 2011

C. S. Chang ,
J. C. Wang  and
L. C. Kuo
C. S. Chang
Affiliation:
Materials Research Laboratories Industrial Technology Research Institute Chutung, Hsinchu 31015, Taiwan, R.O.C.
J. C. Wang
Affiliation:
Materials Research Laboratories Industrial Technology Research Institute Chutung, Hsinchu 31015, Taiwan, R.O.C.
L. C. Kuo
Affiliation:
Materials Research Laboratories Industrial Technology Research Institute Chutung, Hsinchu 31015, Taiwan, R.O.C.
Get access

Abstract

An electron beam evaporation method has been used to prepare tin doped indium oxide (ITO) films with 95 wt.% In2O3 and 5 wt.% SnO2 in an oxygen atmosphere. It was found that the deposition rate and oxygen pressure strongly influence the film properties when the substrate temperature was lower than 200°C. In an optimal condition, highly transparent (transmittance ˜ 90% at wavelength 570 nm) and conductive (resistivity – 3×10−4Ω-cm) films of thickness around 2000 Å at substrate temperature as low as 180°C can be obtained.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 187: Symposium J – Thin Film Structures and Phase Stability , 1990 , 147
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Mansingh, A. and Kumar, C.V.R. Vasant, Thin Solid Films 167, L11 (1988).Google Scholar
2. Nath, P., Bunshah, R.F., Basel, B.M., and Staffsud, D.M., Thin Solid Films 72, 463 (1980).Google Scholar
3. Hamberg, I. and Granqvist, C.G., J.Appl.Phys. 60, R123 (1986).Google Scholar
4. Banerjee, R., Das, D., Ray, S., Batabyal, A.K., and Baraua, A.K., Solar Energy Materials 13, 11 (1986).Google Scholar
5. Hjortsberg, A., Hamberg, I., and Granquist, C.G., Thin Solid Films 90, 323 (1982).Google Scholar
6. Agnihotry, S.A., Saini, K.K., Saxena, T.K., Nagpal, K.C., and Chandra, S., J.Phys. D: Appl. Phys. 18, 2087 (1985).Google Scholar
7. Mizuhashi, M., Thin Solid Films 70, 91 (1980).Google Scholar
8. Chopra, K.L., Major, S., and Pandya, D.K., Thin Solid Films 102, 1 (1983).Google Scholar
9. Jarzebski, Z.M., Phys. Stat. Sol. (A) 71, 13 (1982).Google Scholar