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Laser-induced Reactions in a Deep UV Resist System: Studied with Picosecond Infrared Spectroscopy

Published online by Cambridge University Press:  15 February 2011

T. Lippert ,
A. Koskelo  and
P. O. Stoutland
T. Lippert
Affiliation:
Division of Chemical Science and Technology, Mail Stop J-567, Los Alamos National Laboratory, Los Alamos, NM 87545, lippert@lanl.gov
A. Koskelo
Affiliation:
Division of Chemical Science and Technology, Mail Stop J-567, Los Alamos National Laboratory, Los Alamos, NM 87545, lippert@lanl.gov
P. O. Stoutland
Affiliation:
Division of Chemical Science and Technology, Mail Stop J-567, Los Alamos National Laboratory, Los Alamos, NM 87545, lippert@lanl.gov
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Abstract

One of the most technologically important uses of organic photochemistry is in the imaging industry where radiation-sensitive organic monomers and polymers are used in photoresists. A widely-used class of compounds for imaging applications are diazoketones; these compounds undergo a photoinduced Wolff rearrangement to form a ketene intermediate which subsequently hydrolyses to a base-soluble, carboxylic acid. Another use of organic molecules in polymer matrices is for dopant induced ablation of polymers. As part of a program to develop diagnostics for laser-driven reactions in polymer matrices, we have investigated the photo-induced decomposition of 5-diazo-2,2-dimethyl-l,3-dioxane-4,6-dione (5-diazo Meldrum's acid, DM) in a PMMA matrix using picosecond infrared spectroscopy. In particular, irradiation of DM with a 60 ps 266 nm laser pulse results in immediate bleaching of the diazo infrared band (v = 2172 cm-1). Similarly, a new band appears within our instrument response at 2161 cm-1 (FWHM = 29 cm-1) and is stable to greater than 6 ns.; we assign this band to the ketene photoproduct of the Wolff rearrangement. Using deconvolution techniques we estimate a limit for its rate of formation of τ < 20 ps. The linear dependence of the absorbance change with the pump power (266 nm) even above the threshold of ablation suggest that material ejection take place after 6ns.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 397: Symposium B – Advanced laser Processing of Materials-Fundamentals and Applications , 1995 , 661
Copyright
Copyright © Materials Research Society 1996

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References

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