Hostname: page-component-5c6d5d7d68-xq9c7 Total loading time: 0 Render date: 2024-08-23T12:01:54.861Z Has data issue: false hasContentIssue false
  • English
  • Français

Ion Sources for Ion Beam Assisted Thin Film Deposmon

Published online by Cambridge University Press:  21 February 2011

Igor V. Svadkovsk  and
Anatoly P. Dostanko
Igor V. Svadkovsk
Affiliation:
Belarusian State University of Informatics and Radioelectronics, Modern Electronics Technologies Department, Minsk 220027, Belarus
Anatoly P. Dostanko
Affiliation:
Belarusian State University of Informatics and Radioelectronics, Modern Electronics Technologies Department, Minsk 220027, Belarus
Get access

Abstract

Two types of the ion sources for ion beam assisted deposition using inert gases, oxygen or nitrogen are reported. Their design and operational features are presented. Each of them has the properties of two existing main types of the gridless Hall sources: an end-Hall source and the anode-layer version a closed-drift ion source. Basic distinction of the developed sources is the extended range of ion energies in high-current beam for optimization of deposition, cleaning and etching processes.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 396: Symposium A – Ion-Solid Interactions for Materials Modification and Processing , 1995 , 635
Copyright
Copyright © Materials Research Society 1996

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Kaufman, H.R., Robinson, R.S., Seddon, R.I., J. Vac. Sci. Technol. A5 (4), 2081 (1987).Google Scholar
2 Kaufman, H.R., Robinson, R.S., U.S.Patent No 4,862,032, F 03 H.Google Scholar
3 Harper, J.M.E., Cuomo, J.J., Kaufman, H.R., J. Vac. Sci. Technol. 21 (3), 737(1982).Google Scholar
4 Weissmantel, C., Reisse, G., Erler, H.J., Henny, F., Bewilogus, K., Ebersbach, U., Schurer, C., Thin Solid Films 63, 315 (1979).Google Scholar
5 Harper, J.M.E., Proto, G.R., Hoh, P.D., J. Vac. Sci. Technol. 18 (1), 156 (1981).Google Scholar
6 Proceedings of the IV All-Union Conference on Plasma Accelerators and Ion Injectors, Moscow, 1978, Academy of Science, U.S.S.R. (in Russian).Google Scholar
7 Proceedings of the V All-Union Conference on Plasma Accelerators and Ion Injectors, Minsk, 1982, Academy of Science, U.S.S.R. (in Russian).Google Scholar
8 Ions injectors and Plasma Accelerators, ed. Morozov A.I., - Moskow., Energoizdat, 1990. – 257.Google Scholar
9 Kaufman, H.R., AIAA J. 23 (1), 78 (1985).Google Scholar