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Interference Effects In X-Ray Specular Reflectivity from Thin Films

Published online by Cambridge University Press:  15 February 2011

S. Lagomarsino
Affiliation:
Istituto di Elettronica dello Stato Solido - CNR V. Cineto Romano, 42 00156 Roma, (Italy)
S. Di Fonzo
Affiliation:
Sincrotrone Trieste - Padriciano 99, 34012 Trieste, (Italy)
W. Jark
Affiliation:
Sincrotrone Trieste - Padriciano 99, 34012 Trieste, (Italy)
B. Muller
Affiliation:
Sincrotrone Trieste - Padriciano 99, 34012 Trieste, (Italy)
A. Cedola
Affiliation:
Istituto di Elettronica dello Stato Solido - CNR V. Cineto Romano, 42 00156 Roma, (Italy)
G. Pelka
Affiliation:
Institute of Physics, Al. Lotnikov 32/48 -02-668 Warsaw, (Poland)
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Abstract

A strong resonance effect in the specular reflectivity of a C layer deposited on a Ni surface has been measured. The e.m. field intensity distribution has been monitored by measuring the fluorescence intensity of an ultra-thin Ti layer placed in the C film. The reflected intensity and the fluorescence yield of Ti and Ar (this last trapped in the film because of the deposition by sputtering) have been measured in different samples with a different location of the Ti layer. The results show that with this method a nondestructive, accurate determination of the Ti position can be achieved with a relative accuracy of 10−2

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

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References

[1] Parratt, L.G., Phys. Rev. 95, 359 (1954)CrossRefGoogle Scholar
[2] Bedzyk, M.J., Bommarito, G.M. and Schildkraut, J.S., Phys. Rev. Lett., 62, 1376 (1989)CrossRefGoogle Scholar
[3] Boer, D.K.G. de, Phys. Rev., 44, 498 (1991)CrossRefGoogle Scholar
[4] Wang, J., Bedzyk, M.J. and Caffrey, M., Science, 258,775 (1992)CrossRefGoogle Scholar

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