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High-Rate Deposition of Thin Films by High-Intensity Pulsed Ion Beam Evaporation

Published online by Cambridge University Press:  21 February 2011

A.N. Zakoutayev ,
G.E. Remnev ,
Yu.F. Ivanov ,
M.S. Arteyev ,
V.M. Matvienko  and
A.V. Potyomkin
A.N. Zakoutayev
Affiliation:
Nuclear Physics institute, Tomsk Polytechnic University, Tomsk 634050, Russia
G.E. Remnev
Affiliation:
Nuclear Physics institute, Tomsk Polytechnic University, Tomsk 634050, Russia
Yu.F. Ivanov
Affiliation:
Nuclear Physics institute, Tomsk Polytechnic University, Tomsk 634050, Russia
M.S. Arteyev
Affiliation:
Nuclear Physics institute, Tomsk Polytechnic University, Tomsk 634050, Russia
V.M. Matvienko
Affiliation:
Nuclear Physics institute, Tomsk Polytechnic University, Tomsk 634050, Russia
A.V. Potyomkin
Affiliation:
Nuclear Physics institute, Tomsk Polytechnic University, Tomsk 634050, Russia
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Abstract

A high-intensity ion beam (500 keV, current density 60 - 200 a/cm2, power density (0.25 - 1) • 108 W/cm2, pulse duration 60 ns, pulse repetition rate 4-6 mur-1) was used to deposit thin metal and carbon films by evaporation of respective targets. the instantaneous deposition rate was 0.6 - 5 mm/s. the films were examined using transmission electron microscopy and transmission electron diffraction. the metal films had a poly-crystalline structure with the grains measuring from 20 to 100 nm, the lower the melting point the greater the grain size. the carbon films contained 25 - 125 nm diamonds. the ablation plasma was studied employing methods of pulsed spectroscopy.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 388: Symposium Q – Film Synthesis and Growth Using Energetic Beams , 1995 , 317
Copyright
Copyright © Materials Research Society 1995

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References

1 Shimotori, Y., Yokahama, M., Isobe, H. et al. , J. appl. Phys. 63, 968 (1988).Google Scholar
2 Remnev, G.E. and Shulov, V.A., Laser and Particle Beams 11, 707 (1993)Google Scholar
3 Johnston, G.P., Tiwari, P., Rej, D.J. et al. , J. appl. Phys. 76, 5949 (1994).Google Scholar
4 Isakov, I.F. et al. , Vacuum 42, 159–162 (1991).Google Scholar
5 Rej, D.J., Remnev, G.E. et al. , submitted to the 3rd international Conference on the applications of Diamond Films and Related Materials, 1995.Google Scholar
6 Frish, S.E. in Spectroscopy of Gas-Discharge Plasma (Nauka, Moscow, 1970) p.7.Google Scholar
7 Grechikhin, L.I. et al. in Low-Temperature Plasma (Nauka, Moscow, 1967) p.287.Google Scholar
8 Kasabov, G.A. and Eliseyev, V.V., Spectroscopic Tables for Low-Temperature Plasma (Nauka, Moscow, 1973).Google Scholar
9 Radshchen, A.A. and Smimov, S.M., Parameters of atoms and Ions (Nauka, Moscow, 1986).Google Scholar