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HIGH FREQUENCY TOP-GATED GRAPHENE RF AMBIPOLAR FETs USING LARGE-AREA CVD GRAPHENE AND ADVANCED DIELECTRICS

Published online by Cambridge University Press:  17 March 2011

Osama M. Nayfeh
Affiliation:
United States Army Research Laboratory, Sensors and Electron Devices Directorate, 2800 Powder Mill Road, Adelphi, MD 20783, USA
Madan Dubey
Affiliation:
United States Army Research Laboratory, Sensors and Electron Devices Directorate, 2800 Powder Mill Road, Adelphi, MD 20783, USA
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Abstract

Ambipolar top-gated field effect transistors (FETs) based on large area Cu catalyzed CVD-grown monolayer graphene interfaced to advanced dielectrics have been constructed and examined both for their material and electrical qualities. Interfacing of the graphene with novel insulators/substrates could be tailored for the particular application and provide for enhanced device functionality. In contrast to graphene FETs using SiO2-based top-gate dielectric, which show asymmetric electron/hole mobility (with larger hole mobility), and Dirac point shifted to positive levels, FETs constructed using advanced AlN show Dirac point almost near neutral levels and near symmetric electron/hole mobility. The DP is shifted likely due to compensation of the intrinsic p-type doping by n-type doping introduced by the AlN deposition and potentially via a contribution of polarization-induced carrier density. Finally, we demonstrate a top-gated graphene FET with the first observation of RF operation with GHz cut-off frequency based on large area CVD graphene.

Type
Research Article
Copyright
Copyright © Materials Research Society 2011

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References

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HIGH FREQUENCY TOP-GATED GRAPHENE RF AMBIPOLAR FETs USING LARGE-AREA CVD GRAPHENE AND ADVANCED DIELECTRICS
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