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High deposition rate of low resistive and transparent ZnO:Al on glass with an industrial moving belt APCVD reactor

Published online by Cambridge University Press:  20 June 2011

A. Illiberi ,
B. Kniknie ,
H.L.A.H. Steijvers ,
D. Habets ,
P.J.P.M. Simons ,
E.H.A. Beckers  and
J. Van Deelan
A. Illiberi*
Affiliation:
Netherlands Organization for Applied Scientific Research (TNO), PO Box 6235, 5600 HE Eindhoven, The Netherlands
B. Kniknie
Affiliation:
Netherlands Organization for Applied Scientific Research (TNO), PO Box 6235, 5600 HE Eindhoven, The Netherlands
H.L.A.H. Steijvers
Affiliation:
Netherlands Organization for Applied Scientific Research (TNO), PO Box 6235, 5600 HE Eindhoven, The Netherlands
D. Habets
Affiliation:
Netherlands Organization for Applied Scientific Research (TNO), PO Box 6235, 5600 HE Eindhoven, The Netherlands
P.J.P.M. Simons
Affiliation:
Netherlands Organization for Applied Scientific Research (TNO), PO Box 6235, 5600 HE Eindhoven, The Netherlands
E.H.A. Beckers
Affiliation:
Netherlands Organization for Applied Scientific Research (TNO), PO Box 6235, 5600 HE Eindhoven, The Netherlands
J. Van Deelan
Affiliation:
Netherlands Organization for Applied Scientific Research (TNO), PO Box 6235, 5600 HE Eindhoven, The Netherlands
*
*Corresponding author: andrea.illiberi@tno.nl
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Abstract

Aluminum doped ZnOx (ZnOx:Al) films have been deposited on glass in an in-line industrialtype reactor by a metalorganic chemical vapor deposition process at atmospheric pressure. ZnOx:Al films can be grown at very high deposition rates of ~ 14 nm/s for a substrate speed from 150 mm/min to 500 mm/min. ZnOx:Al films are highly conductive (R < 9 Ohm/sq, for a film thickness above 1300 nm) and transparent in the visible range (> 80%). Amorphous silicon p-i-n solar cells have been grown on as deposited ZnOx:Al films, without optimizing the surface texturing of ZnOx:Al films to enhance light scattering. An initial efficiency of approximately 8% has been achieved.

Keywords

chemical vapor deposition (CVD) (deposition)crystal growthphotovoltaic
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1323: Symposium C – Advanced Materials Processing for Scalable Solar-Cell Manufacturing , 2011 , mrss11-1323-c03-32
Copyright
Copyright © Materials Research Society 2011

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References

REFERENCES

[1] Granqvist, C.G., Solar Energy Mater. Solar Cells 91, 1529 (2007).Google Scholar
[2]“Zinc Oxide: From Fundamental Properties Towards Novel Applications” , byKlinshirn, C. F., Meyer, B. K., Wang, A., Hoffmann, A. and Geurts, J., Springer Series in Mater. Sci. 120 (2010) .Google Scholar
[3] Illiberi, A., Sharma, K., Creatore, M., van de Sanden, M.C.M., Mater. Lett., 63, 1817 (2009)Google Scholar
[4] Banerjee, R., Ray, S., Basu, N., Batabyal, A.K. and Barua, A.K. J. Appl. Phys. 62, 912 (1987).Google Scholar
[5] Minami, T., Thin Solid Films, 516, 5822 (2008).Google Scholar
[6] Hu, J. and Gordon, R.G., J. Appl. Phys. 71, 880 (1992).Google Scholar
[7] Volintiru, I., Creatore, M., Kniknie, B.J., Spee, C.I.M.A. and van de Sanden, M.C.M., J. Appl. Phys. 102, 043709 (2007).Google Scholar
[8] Sittinger, V., Ruske, F., Werner, W., Szyszka, B., Rech, B., Hupkes, J., Schope, G., Stiebig, H., Thin Solid Films 496, 16 (2006).Google Scholar
[9] Matsubara, K., Fons, P., Iwata, K., Yamada, A., Sakurai, K., Tampo, H., Niki, S., Thin Solid Films 431, 369 (2003).Google Scholar
[10] Major, S., Banerjee, A. and Chopra, K.L., Thin Solid Films 108, 333 (1983).Google Scholar
[11] Zhu, M.W., Gong, J., Sun, C., Xia, J.H. and Jiang, X., J. App. Phys. 104, 073113 (2008).Google Scholar
[12] Hu, J., Gordon, R. G., J. Appl. Phys. 71, 880 (1992).Google Scholar
[13] Smith, F.T.J., App. Phys. Lett. 43, 1108(1983).Google Scholar
[14] Illiberi, A., Kniknie, B., Steijvers, H.L.A.H., Habets, D., Simons, P.J.P.M., Janssen, A.C., Beckers, E.H.A., van Deelen, J., Solar Energy Materials and Solar Cells doi:10.1016/j.solmat.2011.01.007 (2011).Google Scholar
[15] Hong, R.J., Jiang, X., Szyszka, B., Sittinger, V., Xu, S.H., Werner, W., Heide, G., J. Crystal Growth 253, 117(2003).Google Scholar