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Effects of Reactive Sputtering Parameters on the Growth and Properties of Acoustooptic ZnO Films
Published online by Cambridge University Press: 25 February 2011
Abstract
1 μm ZnO films were deposited on SiO2 by reactive sputtering using a D. C. magnetron gun. The microstructure, orientation and chemistry of the deposited layers were examined. It is shown that the oxygen partial pressure plays an important role in the structure of the layer through a mechanism of surface diffusion.
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- Copyright © Materials Research Society 1992
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