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Dislocation Nucleation Models From Point Defect Condensations in Silicon and Germanium

Published online by Cambridge University Press:  15 February 2011

T.Y. Tan*
Affiliation:
IBM T.J. Watson Research Center, Yorktown Heights, N.Y. 10598
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Abstract

The process of dislocation nucleation from point defect condensations in Si(Ge) is discussed. Based on the assumption that during the dislocation nucleation stage, the dominant factor in the configurational energy is the number of dangling bonds per point defect incorporated, rather than the more commonly recognized factor of strain energy, it is possible to model the dislocation nucleation process. In order to minimize the number of dangling bonds, point defects would condense into row configurations elongated in <110>, called intermediate defects (IDC), and then the IDCs would evolute into undissociated 90° edge –, 60°, and Frank partial dislocations.

Type
Research Article
Copyright
Copyright © Materials Research Society 1981

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References

REFERENCES

1. Corbert, J.W. and Bourgoin, J.C., in “Point Defects in Solids”, eds. Crowford, J.H., Slifkin, L.M., (Plenum, N.Y., 1975) vol. 2, p. 1.Google Scholar
2. Mazey, D.J., Nelson, R.S. and Barnes, R.S., in “Proc. 6th International Conf. on Electron Microscopy”, ed: Uyeda, R. (Maruzen Co. L 1966) p. 363.Google Scholar
3. Bicknell, R.W., Proc. R. Soc. A31, 75 (1969).Google Scholar
4. Davidson, S.M. and Booker, G.R., Rad. Eff. 6, 33 (1970).CrossRefGoogle Scholar
5. Chadderton, L.T. and Eisen, F.H., Rad. Eff. 7, 129 (1971).CrossRefGoogle Scholar
6. Maden, P.K. and Davidson, S.M., Rad. Eff. 14, 271 (1972).Google Scholar
7. Matthews, M.D. and Ashby, S.J., Phil. Mag. 27, 1313 (1973).Google Scholar
8. Wu, W.K. and Washburn, J., J. Appl. Phys. 48, 3742 (1977).CrossRefGoogle Scholar
9. Seshan, K. and Washburn, J., Rad. Eff. 14, 267 (1972).Google Scholar
10. Nes, E. and Washburn, J., J. Appl. Phys. 42, 3559 (1972).CrossRefGoogle Scholar
11. Aseev, A.L., Bolotov, V.V., Smirnov, L.S. and Stenin, S.T., Soy. Phys. Semicond. 13, 764 (1979).Google Scholar
12. Salisbury, I.G. and Loretto, M.H., Phil. Mag. A39, 317 (1979).CrossRefGoogle Scholar
13. Ferreira Lima, C.A. and Howie, A., Phil Mag. 34, 1057 (1976).Google Scholar
14. Hornstra, J., J. Phys. Chem. Solids 5, 129 (1958).CrossRefGoogle Scholar
15. Tan, T.Y., Phil. Mag. to be published.Google Scholar