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Published online by Cambridge University Press: 11 February 2011
Chemical-vapor-deposition of titanium tetra-isopropoxide (TTIP) under the atmosphere at low temperature has been conducted. The structure of the obtained films was assessed using Fourier transform infrared spectroscopy, X-ray diffractometry and Raman spectroscopy. These analyses indicated that amorphous TiOxHy films were obtained at gas temperatures in the range of 150–300 °C, and crystalline anatase-TiO2 film was formed at 350 °C. This distinction is accounted for by plausible chemical reactions as follows; the hydroxyl reaction of TTIP below 350 °C promotes the formation of the amorphous TiOxHy. As the temperature goes up to 350 °C, dehydrogenation of the TiOxHy films promotes to form crystalline TiO2. Also the obtained amorphous films were annealed for 10 min under the atmosphere in assessing the transformation proceeding in the solid state. The structural change is shown at 350 °C, indicating that the crystalline phase would be formed via dehydrogenation and polymerization on the surface of the amorphous phase under the atmosphere. The crystal size of the annealed films was evaluated in assessment for the transformation.